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首页> 中文期刊> 《物理化学学报》 >TixV1-xO2薄膜的光学及相变特性

TixV1-xO2薄膜的光学及相变特性

         
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采用射频磁控溅射方法,在c-Al2O3(0001)基底上制备了不同钒钛比例的TixV1-xO2(0≤x≤1)薄膜,利用X射线衍射(XRD)、拉曼(Raman)光谱、紫外-可见-近红外(UV-Vis-NIR)光谱对薄膜结构及光学性能进行测试分析,计算薄膜的太阳能智能调节率和光学带隙.实验结果及分析表明；随着Ti含量的增加,薄膜的红外调节特性和热滞特性逐渐减弱直至消失；薄膜样品的光学带隙随着Ti含量的增加而变宽,光响应范围发生蓝移；其光学带隙随着V含量的增加而变窄,光响应范围发生红移.%TixV1-xO2 (0 ≤ x<1) thin films with different molar ratios of V/Ti were prepared on c-plane sapphire (0001) substrates by radio frequency magnetron sputtering. The microstructure and optical properties of the thin films were determined by X-ray diffraction (XRD), Raman spectroscopy, and UV-visible-near infrared (UV-Vis-NIR) spectroscopy. The width of the optical band gap was calculated and the integrated solar transmittance of the films was characterized. As the content of titanium was increased, infrared regulation and thermal hysteresis were gradually reduced until they disappeared. The results show that the band gap of the thin films broadens as the content of titanium increases, causing the optical absorption edge to exhibit a blue shift. Conversely, the band gap narrows as the proportion of vanadium is increased, which causes a red shift of the optical absorption edge.

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