室温下用直流磁控溅射法在PET塑料基板上制备氧化锌薄膜及掺铝氧化锌AZO(ZnO∶Al)薄膜.通过X射线衍射仪(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)、四点探针仪、霍尔效应仪及光谱仪等装置,考察了氧分率、溅射功率及铝掺杂量等工艺参数对薄膜微观结构和光电性能的影响.结果表明:AZO薄膜晶体结构为纯ZnO的六角纤锌矿结构.随着Al掺杂量增多,AZO薄膜导电性增加,透光率下降.在氧分率为8.2％,ZnO(40 nm)/Al(6 nm)三层膜条件下,得到电阻率为5.66×10-2Ω·cm,可见光范围内透光率约为80％的AZO薄膜.%ZnO and AZO (ZnO: Al) thin films were deposited on PET substrates using the magnetron reactive sputtering process. Process parameters such as the oxygen to argon ratio, input power, and Al content in the films were controlled. The scanning electron microscope (SEM) , transmission electron microscope (TEM), X-ray diffraction (XRD), Hall effect instrument, four-point probe and spectrometer were used to detect the thickness, morphology, crystal structures, electric resistivity and optical transmittance for ZnO and AZO films, respectively. Results show that AZO thin films consist of single phase ZnO with hexagonal wurtz-ite structure through XRD and TEM analysis. The electric resistivity increases and optical transmittance decreases with increasing Al contents in the films. The electric resistivity of 5. 66 X 10-z Ω o cm and 80% optical transmittance are obtained with 8. 2% of oxygen flow percentage and three-layer films of ZnO film (40 nm) and Al film (6 nm) combination.
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