The growth mode and interfacial interaction of Cu nanoparticles on the ordered ZrO2( 111) thin film surfaces have been studied by low energy electron diffraction, synchrotron radiation photoemission spectroscopy, and X-ray photoelectron spectroscopy. The ZrO2(lll) thin film was grown on Pt( 111) using the molecular beam epitaxy technique. At room temperature, copper initially grows two-dimensionally on the ZrO2(lll) thin film up to 0.15 monolayer (ML), followed by three-dimensional islanding. The binding energy of Cu 2p3/2 increases with decreasing the Cu coverage, owing to the contribution from both the initial-state and final-state effects. The interaction between Cu and ZrO2 leads to the charge transfer from Cu to the ZrO2 substrate, which causes the appearance of Cu(I) state. Above 1 ML, Cu becomes metallic state on ZrO2.%采用分子束外延法在Pt(111)单晶表面上制备有序的ZrO2(111)薄膜,利用低能电子衍射谱、同步辐射光电子能谱和X射线光电子能谱研究了Cu纳米颗粒在ZrO2(111)薄膜表面的生长模式和界面相互作用.结果表明,室温下Cu先以二维模式生长到0.15单层(ML),接着以三维模式生长.随着Cu覆盖度的减小,Cu 2p3/2峰逐渐向高结合能位移,可归因于初态效应和终态效应共同作用的结果.Cu最初沉积到ZrO2表面时,两者间存在较强的相互作用,Cu向ZrO2衬底传递电荷,以Cu(I)形式出现.当Cu覆盖度增加到1 ML以后,Cu开始表现出金属特征.
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