利用射频磁控溅射法在玻璃衬底上制备了Ga掺杂的TiO_2薄膜,并在真空中于550℃下进行了2 h的退火处理.采用XRD、SEM、UV-Vis和PL光谱对薄膜进行了表征.XRD结果提示,在溅射功率为200 W,室温下制备的TiO_2薄膜具有混晶结构,且退火后的晶粒有长大的趋势.SEM分析表明.掺Ga薄膜的颗粒分布得较为均匀并存在尺寸变小的趋势,且出现有利于提高光催化性能的岛状结构,其平均颗粒尺寸为50 nm.UV-Vis透过谱指出,掺Ga后的TiO_2薄膜吸收边发生了明显红移,且退火后进一步红移了10～50 nm.通过接触角的测量与计算可知,550℃退火2 h后的薄膜具有良好的亲水性.光催化降解结果表明:样品具有较强的光催化能力.当用低功率(15 W)紫外灯照射8 h后,Ga掺杂的纳米TiO_2薄膜样品对亚甲基蓝溶液的降解率最高可达到71.8%.%The gallium-doped TiO_2 thin films were deposited on glass substrate by Radio Frequency(RF) magnetron sputtering, and annealing treated in vacuum for 2 h at 550℃. The films were characterized using XRD, SEM, UV-Vis transmission spectraoscopy. XRD results show that the TiO_2 thin films change to mixed crystal with sputtering power of 200 W at room temperature, and the gains have grown up trend after annealing. SEM results reveal that Ga-doped thin films have a more uniform and smaller particle size distribution with an average size of 30 nm. The surface morphology is land-like. UV-Vis transmission spectra show that the absorption edge of the Ga-doped thin films occurs obviously red-shifted, and even a red-shift of 10～50 nm is found after annealing. The films have good hydrophilicity as evidenced by contact angle measurement and calculation. The samples exibit good photocatalytic activity as shown by the degradation rate of 71.8% for methylene blue solution after 8 h irradiation under low power UV lamp(15 W).
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