首页> 中文期刊> 《中国物理快报:英文版》 >Formation of Carbon Nitride Films by Nitrogen Ion Bombardment on C_(60) Films

Formation of Carbon Nitride Films by Nitrogen Ion Bombardment on C_(60) Films

         

摘要

The synthesis of covalent carbon nitride films becomes an important subject in the materials research field.As a new synthetic method two low-energy(400 and 1000eV)nitrogen ion beams are used to bombard on C_(60) thin films individually.The bombarded films are used for Raman and x-ray photoelectron spectroscopy(XPS)measurements.The results of the analyses show that under the bombardment of 400eV nitrogen ion beam,the film still contains a large amount of undestructed C_(60) molecules.In the case of l000eV bombardment,only a little amount of C_(60) molecules is kept undestructed.The experimental results also show that the destructed carbon species will combine chemically with nitrogen ions to form stable covalent carbon nitride,confirmed by the Raman peaks of,e.g.,2240cm-1.The XPS Nls and Cls lines also indicate the formation of covalent carbon nitride in the bombarded films.

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