Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

R. Pelzer; P. Lindner; T. Glinsner; B.Vratzov; C.Gourgon; S.Landis; P. Kettner; C. Schaefer

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Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

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Nanoimprint Lithography has been demon-strated to be one of the most promising next genera-tion techniques for large-area structure replicationin the nanometer scale. This fast and low costmethod becomes an increasingly important instru-ment for fabrication of biochemistry,m-fluidic, m-TAS and telecommunication devices, as well as for awide variety of fields in the nm range, like biomedical,nano-fluidics,nano-optical applications, datastorage, etc.Due to the restrictions on wavelength and theenormous development works, linked to high pro-cess and equipment costs on standard lithographysystems, nanoimprint lithography might become areal competitive method in mainstream IC industry.There are no physical limitations encountered withimprinting techniques for much smaller replicatedstructures, down to the sub-10nm range [1]. Amongseveral Nanoimprint lithography techniques resultsof two promising methods, hot embossing lithogra-phy (HEL) and UV-nanoimprinting (UV-NIL) will bepresented. Both techniques allow rapid prototypingas well as high volume production of fully patternedsubstrates for a wide range of materials.This paper will present results on HE and UV-NIL, among them full wafer imprints up to 200mmwith high-resolution patterns down to nm range.

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来源
《半导体技术》 |2004年第7期|86-91|共6页
作者
R. Pelzer; P. Lindner; T. Glinsner; B.Vratzov; C.Gourgon; S.Landis; P. Kettner; C. Schaefer;
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作者单位

EV Group;

DI Erich Thallner Strasse 1;

A-4780 Schaerding;

EV Group;

DI Erich Thallner Strasse 1;

A-4780 Schaerding;

EV Group;

DI Erich Thallner Strasse 1;

A-4780 Schaerding;

AMICA;

AMO GmbH;

Huysensweg 25;

D-52074 Aachen;

Laboratoire des Technologies de la Microelectronique CNRS;

17 R. des Martyrs;

F- 3805;

Grenoble Cedex4CEA-LETI;

17 R. des Martyrs;

F- 38054 Grenoble Cedex;

EV Group;

DI Erich Thallner Strasse 1;

A-4780 Schaerding;

EV Group;

DI Erich Thallner Strasse 1;

A-4780 Schaerding;

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原文格式 PDF
正文语种 chi
中图分类光刻、掩膜;
关键词
光刻; HEL; UV-NIL; MCP; 光对准;

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专利

1. Large area mold fabrication for the nanoimprint lithography using electron beam lithography [J] . . 中国科学 . 2010,第001期
2. Low k1 Lithography: Resolution Enhancement Techniques [C] . . 中国光学学会2004年学术大会 . 2004
3. Preparation and Characterization of Polymer LB Films for Lithography [A] . 任方方 . 2006

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

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