In order to manufacture reaction bonded silicon carbide(RB-SiC) mirrors of fine optical surface, 100 μm thick Si coatings were prepared by RF magnetron sputtering on RB-SiC substrates of 70 mm diameter and then polished. Tests with ZYGO surface profilometer show that the RMS surface roughness of the surface-modified RB-SiC achieves 0. 496 nm. X-ray diffraction analyses reveal the polycrystalline structure of the Si coatings. Moreover, the adhesion between Si coating and RB-SiC substrate measured by direct pull-off method is more than 10. 7 MPa. Therefore, the magnetron sputtered Si coating can satisfy the requirements of RB-SiC surface modification.%为了获得高质量光学表面的碳化硅反射镜,利用射频磁控溅射方法,在直径70 mm的RB-SiC基片上沉积了厚约100 μm的Si改性涂层,对改性层进行超光滑加工,并对改性层的表面形貌及性能进行了测试.ZYGO表面粗糙度仪测试结果表明,抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm;X射线衍射仪测试显示,制备Si改性涂层为多晶结构;使用拉力机做附着力测试,结果表明膜基附着力大于10.7 MPa.证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好,能够满足RB-SiC材料表面改性要求.
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