为了在激光退火工作面上获得高均匀度光斑,研究了双复眼透镜阵列光束匀化法中两透镜阵列间相对位置变化对匀化性能的影响.利用光线追迹方法,模拟了双复眼透镜阵列间6个自由度的相对位置误差与光束匀化效果的依赖关系,发现第二复眼透镜阵列的滚转角偏差是影响光束匀化质量的最敏感因素.为实现较好的匀化效果,需要对复眼透镜阵列位置进行精确控制.结果表明,使用专用镜架对透镜位置进行精确控制后,光束均匀度达到0.039.该系统成功应用于激光退火装置,实现了超浅结激光退火.%In order to obtain a working beam profile with high uniformity by microlens arrays pair in laser annealing equipment, the effect of relative position error of arrays pair was investigated. The dependence of the beam uniformity on the six degrees of freedom between two arrays was simulated with ray tracing method. It is found that the beam homogenization is most sensitive to roll angle error of the second array, and precise control of relative position of two arrays is needed. The experiment results indicate that, with the aid of special lens mounts, the relative position of two arrays can be controlled precisely and a flattop beam profile with beam uniformity of 0. 039 is obtained as well. The laser annealing experiment for ultra shallow junction formation is demonstrated by this homogeneous beam successfully.
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