使用Murakami溶液和王水预处理高钴硬质合金刀片,并用直流磁控溅射(DCS)技术在此硬质合金上溅射铝过渡层,在热丝化学气相沉积(HFCVD)设备里沉积金刚石薄膜；分析了金刚石形核机理,并利用SEM以及Raman等方法表征试样.结果表明:与未溅射过渡层的样品相比,在过渡层上的金刚石形核密度更高,金刚石颗粒尺寸更加细小.%The WC-I0%Co cutting tool material is pre-treated by Murakami solution and aqua regiaj then aluminum( AI) is sputtered on the hard-metal by direct current magnetron sputtering (DCS) technology. Diamond thin films are deposited on the cemented carbide by hot filament chemical vapor deposition (HFCVD) process. The diamond nucleation mechanism on the hard-metal is analyzed. The results show that as compared with uncoated AI interlayer sample, its diamond nucleation density is higher and the diamond grain size is smaller.
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