SnO2 inverse opal thin films were fabricated by filling opal films of polystyrene (PS) spheres with SnO2 and then removing the PS spheres through calcining at 450°C. The filling process of opal films was accomplished by the dip-drawing method and Sol-LPD method. The quality of photonic crystal samples were assessed by SEM and UV-Vis spectrophotometer. It is found that the obtained SnO2 inverse opals displayed the three-dimensional ordered structure. Brag reflection peaks of the SnO2 inverse opal films prepared by Sol-LPD method is red-shifted, in compared to that prepared by dip-drawing method of the same PS template, indicating that the filling rate of SnO2 inverse opal films prepared by Sol-LPD method was higher than that prepared by dipping drawing method SnO2 heterostruc-ture inverse opal film were fabricated by Sol-LPD filling method.%以PS opal膜为模板制得了SnO2反opal光子晶体膜.采用浸渍提拉法和Sol-LPD法对PS opal模板进行填充,450℃焙烧除去PS模极得到SnO2反opal光子晶体.SEM和UV-Vis透射表征显示,两种填充方式都能得到三维有序的SnO2反opal光子晶体；以相同的PS opal膜为模板,通过Sol-LPI填充法得到的SnO2反opal膜的禁带位置向长波移动(以浸渍提拉法制得的光子晶体的禁带位置为基准).这证实Sol-LPD填充法比浸渍提拉法有更高的填充率.通过Sol-LPD填充法还能够制备具有多重禁带的SnO2反opal异质复合膜.
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