首页> 中文期刊> 《材料导报》 >Gd磁控溅射不锈钢薄膜生长形貌及附着性能研究

Gd磁控溅射不锈钢薄膜生长形貌及附着性能研究

         

摘要

In order to study the adhesion of sputtering protective coating of Gd,Gd substrates were coated with 1Cr18Ni9Ti by means of DC magnetron sputtering technology. The characteristics of the film were investigated by scanning electron microscopy(SEM), EDS, SPM and the adhesive strength of film was tested by tension test. The results show that the films of 1Cr18Ni9Ti present in island-like distribution when the sputtering was initiated and the grains are fibrous. When sputtering for a few minutes, the films are smooth and perfect, the interface bonding between 1Cr18Ni9Ti and Gd is strong, and when the sputtering density is 966W/cm2 and the sputtering time is 8 min,the largest adhesive strength is 24. 7MPa.%为探讨磁致冷材料Gd表面溅射保护膜后的附着性能,利用直流磁控溅射技术在Gd基体上镀不锈钢(1Cr18Ni9Ti)薄膜.采用扫描电镜(SEM)﹑能谱仪﹑扫描探针显微镜对薄膜进行了表征,并用引拉法测定了薄膜的附着强度.结果表明,不锈钢薄膜溅射初期呈岛状分布;溅射一定时间后薄膜呈层状生长,表面质量好,膜/基界面结合好,附着强度高,在功率密度为966W/cm2、溅射时间为8min时附着强度达到最大值24.7MPa.

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