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首页> 中文期刊> 《光学精密工程》 >大型X射线光学仪器:单层镜和多层镜的制造与表征

大型X射线光学仪器:单层镜和多层镜的制造与表征

         
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Various X-ray optics with an optical length of 150～500 mm are employed for beam guidance,beam alignment and monochromatization.This paper focuses on two different types of large Xray mirrors.The first optical element is a single-layer mirror which works as a total-reflection mirror in the soft X-ray range(50～200 eV)and at a grazing incidence angle of 2°.Such a mirror is used in free-electron lasers,e.g.FLASH in Hamburg,Germany.The second mirror is a multilayer mirror,which is employed as a reflector due to its Bragg reflection for the hard X-ray range(20～50 keV)and at incidence angles of 0.4～1°.Such a mirror could be used at a synchrotron storage ring,for instance in a tomography beamline.In both cases,the mirrors are fabricated by means of state-of-the-art physical vapour deposition techniques,using magnetron sputtering to achieve a good optical quality for their X-ray optical application.This deposition process allows good run-to-run stability,which is crucial for the final deposition of the actual mirror on a high-quality substrate.Both the single and the multilayer mirrors have a high reflectivity for their relevant energy range,a low roughness on their surfaces and a good uniformity of these properties over the whole optical wavelength.The investigations described here are performed by means of X-ray reflectometry(XRR),transmission electron microscopy(TEM),optical profilometry(OP)and atomic force microscopy(AFM).%150～500 mm长度的各种X射线光学元件可用于光束导引,光束调整,以及单色化.本文介绍了两种不同的大型X射线反射镜.第一种为单层反射镜,这种反射镜以2°掠入射角在软X射线区(50～200 eV)起全反射镜作用,可用于自由电子激光器,如德国汉堡的FLASH.第二种是多层镜,由于它的布喇格反射特性,适于作为反射镜以0.4～1°的入射角用于硬X射线区(20～50 keV),如层析光束线的同步辐射存储环中.两种反射镜都用最新物理汽相淀积法制备,并用磁控溅射来实现X射线光学应用所需要的优良光学品质.这一淀积工艺使不同批次的镀膜稳定性良好,有利于实际反射镜在优质衬底上的最后淀积.单层镜和多层镜在它们的相关能量范围内都有很高的反射率,表面粗糙度也很低,且在整个光学波长区这些特性表现均匀.文中所叙相关研究都是借助X射线反射计量(XRR)法,透射电子显微镜(TEM)、光学轮廓仪(OP),以及原子力显微镜(AFM)完成的.

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