以(3+1)的HCl+HNO320mL溶解样品,采用电感耦合等离子体原子发射光谱法测定铜粉中8种杂质元素.通过实验选择各元素最佳分析谱线,并对基体干扰及共存元素间的干扰进行探讨.在选定的实验条件下,方法的检出限[1]为0.0003~0.004ng/mL,样品加标回收率为97~106%,工作曲线回归系数为0.9998~1.0000.此方法对铜粉的分析测定值与原子吸收法、滴定法等方法的测定结果相一致,相对标准偏差为 0.50~2.9%.该技术大大提高了分析检测的速度,降低了劳动强度,精密度、准确度较高,适合铜粉中杂质分析检测.%The determination of the contents of eight elements (Pb, Zn, Ni, As, Bi, Sb, Cd, Hg) in the anode copper by inductively coupled plasma atomic emission spectrometry was discussed in this paper. The samples were dissolved with HNO3(1+1) and the matrix interference were discussed. Under the selected experimental conditions, the detection limit of this method was 0.0003~0.004ng/mL, the recovery rates were 97%~106%, and the regression coefficients of work curve were 0.9998~1.0000. The results were in accordance with the atomic absorption method, with the standard deviation 0.5~2.9%. This technology greatly improved the speed of analysis and detection, with a higher precision. It is suitable for anode copper impurities assay.
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