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Ultra Uniform Pb0.865La0.09(Zr0.65Ti0.35)O3 Thin Films with Tunable Optical Properties Fabricated via Pulsed Laser Deposition

机译:通过脉冲激光沉积制备具有可调光学性能的超均匀Pb0.865La0.09(Zr0.65Ti0.35)O3薄膜

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摘要

Ferroelectric thin films have been utilized in a wide range of electronic and optical applications, in which their morphologies and properties can be inherently tuned by a qualitative control during growth. In this work, we demonstrate the evolution of the Pb0.865La0.09(Zr0.65Ti0.35)O3 (PLZT) thin films on MgO (200) with high uniformity and optimized optical property via the controls of the deposition temperatures and oxygen pressures. The perovskite phase can only be obtained at the deposition temperature above 700 °C and oxygen pressure over 50 Pa due to the improved crystallinity. Meanwhile, the surface morphologies gradually become smooth and compact owing to spontaneously increased nucleation sites with the elevated temperatures, and the crystallization of PLZT thin films also sensitively respond to the oxygen vacancies with the variation of oxygen pressures. Correspondingly, the refractive indices gradually develop with variations of the deposition temperatures and oxygen pressures resulted from the various slight loss, and the extinction coefficient for each sample is similarly near to zero due to the relatively smooth morphology. The resulting PLZT thin films exhibit the ferroelectricity, and the dielectric constant sensitively varies as a function of electric filed, which can be potentially applied in the electronic and optical applications.
机译:铁电薄膜已被广泛用于电子和光学应用中,通过生长过程中的定性控制可以固有地调节铁电薄膜的形态和性能。在这项工作中,我们通过控制沉积温度和氧气压力,证明了MgO(200)上Pb0.865La0.09(Zr0.65Ti0.35)O3(PLZT)薄膜的发展,具有高均匀性和优化的光学性能。 。由于改善的结晶度,仅在高于700°C的沉积温度和超过50 Pa的氧气压力下才能获得钙钛矿相。同时,由于高温自发增加的成核位置,表面形貌逐渐变得光滑致密,并且PLZT薄膜的结晶也随着氧压的变化敏感地响应于氧空位。相应地,由于各种轻微的损失导致折射率随沉积温度和氧气压力的变化而逐渐发展,并且由于相对光滑的形态,每个样品的消光系数相似地接近零。所得的PLZT薄膜具有铁电性,介电常数随电场的变化而灵敏地变化,可潜在地应用于电子和光学应用中。

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