Nanoelectromechanical devices, which can be used as nanotools in nanofactories, were fabricated by focused ion beam chemical vapor deposition (FIB-CVD). The devices are made of diamond-like carbon (DLC), deposited on a Si substrate using gasified phenanthrene (C14H10) as a carbon source. The Young modulus and density of the deposited DLC were measured as 190 GPa and 3.8 g cm−3, respectively. The work function was smaller for DLC (2.9 eV) than for W (4.7 eV) and Fe (5.2 eV) deposited by FIB-CVD. A nanomanipulator was manufactured by FIB-CVD and used for actual manipulations. A glass capillary based local field emitter was developed and produced as a tool for spot deposition, and its electron field emission was confirmed. FIB-CVD is proven as an efficient fabrication technology of novel nanoelectromechanical devices.
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机译：通过聚焦离子束化学气相沉积（FIB-CVD）制造了可在纳米工厂中用作纳米工具的纳米机电设备。器件由类金刚石碳（DLC）制成，并使用气化菲（C14H10）作为碳源沉积在Si基板上。所沉积的DLC的杨氏模量和密度分别为190 GPa和3.8 g cm -3 。 DLC（2.9 eV）的功函比FIB-CVD沉积的W（4.7 eV）和Fe（5.2 eV）小。纳米操纵器由FIB-CVD制造，并用于实际操纵。开发并生产了基于玻璃毛细管的局部场发射器，作为点沉积的工具，并确认了其电子场发射。 FIB-CVD被证明是新型纳米机电装置的有效制造技术。
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