首页> 美国卫生研究院文献>Science and Technology of Advanced Materials >Soft x-ray reflectometry hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks
【2h】

Soft x-ray reflectometry hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO2(Ti)/SiO2/Si stacks

机译:TiO2(Ti)/ SiO2 / Si叠层内部结构的软X射线反射法硬X射线光电子能谱和透射电子显微镜研究

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO2/SiO2/Si and Ti/SiO2/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity curves measured versus the incidence angle at different soft x-ray reflection (SXR) photon energies. The results were confirmed by the conventional techniques of hard x-ray photoelectron spectroscopy (HXPES) and high-resolution transmission electron microscopy (HRTEM). The depth variation of the chemical composition, thicknesses and densities of individual layers extracted from SXR and HXPES measurements are in close agreement and correlate well with the HRTEM images.
机译:我们开发了一种反射测量数据的数学分析方法,并将其用于表征TiO2 / SiO2 / Si和Ti / SiO2 / Si叠层的内部结构。通过分析在不同的软X射线反射(SXR)光子能量下测得的反射率曲线与入射角的关系,可以重构出组成样品的所有化学元素的原子浓度分布。结果通过硬X射线光电子能谱(HXPES)和高分辨率透射电子显微镜(HRTEM)的常规技术得到了证实。从SXR和HXPES测量中提取的各个层的化学成分,厚度和密度的深度变化非常一致,并且与HRTEM图像很好地相关。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号