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Solvent immersion imprint lithography: A high-performance semi-automated procedure

机译:溶剂浸渍压印光刻:高性能半自动程序

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摘要

We expand upon our recent, fundamental report on solvent immersion imprint lithography (SIIL) and describe a semi-automated and high-performance procedure for prototyping polymer microfluidics and optofluidics. The SIIL procedure minimizes manual intervention through a cost-effective (∼$200) and easy-to-assemble apparatus. We analyze the procedure's performance specifically for Poly (methyl methacrylate) microsystems and report repeatable polymer imprinting, bonding, and 3D functionalization in less than 5 min, down to 8 μm resolutions and 1:1 aspect ratios. In comparison to commercial approaches, the modified SIIL procedure enables substantial cost reductions, a 100-fold reduction in imprinting force requirements, as well as a more than 10-fold increase in bonding strength. We attribute these advantages to the directed polymer dissolution that strictly localizes at the polymer-solvent interface, as uniquely offered by SIIL. The described procedure opens new desktop prototyping opportunities, particularly for non-expert users performing live-cell imaging, flow-through catalysis, and on-chip gas detection.
机译:我们扩展了有关溶剂浸没式光刻技术(SIIL)的最新基础报告,并描述了用于聚合物微流体和光流体原型设计的半自动化和高性能程序。 SIIL程序通过具有成本效益(约200美元)且易于组装的设备将手动干预减至最少。我们专门针对聚(甲基丙烯酸甲酯)微系统分析了该程序的性能,并报告了可重复进行的聚合物压印,键合和3D功能化,并在不到5分钟的时间内完成,分辨率低至8 µm,纵横比为1:1。与商业方法相比,修改后的SIIL程序可大幅降低成本,压印力要求降低100倍,粘合强度提高10倍以上。我们将这些优势归因于定向聚合物溶解,该定向聚合物溶解严格位于聚合物-溶剂界面,这是SIIL唯一提供的。所描述的过程为新的桌面原型开发机会提供了机会,特别是对于执行活细胞成像,流通催化和芯片上气体检测的非专业用户而言。

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