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Contamination-free graphene by chemical vapor deposition in quartz furnaces

机译:石英炉中化学气相沉积产生的无污染石墨烯

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摘要

Although the growth of graphene by chemical vapor deposition is a production technique that guarantees high crystallinity and superior electronic properties on large areas, it is still a challenge for manufacturers to efficiently scale up the production to the industrial scale. In this context, issues related to the purity and reproducibility of the graphene batches exist and need to be tackled. When graphene is grown in quartz furnaces, in particular, it is common to end up with samples contaminated by heterogeneous particles, which alter the growth mechanism and affect graphene’s properties. In this paper, we fully unveil the source of such contaminations and explain how they create during the growth process. We further propose a modification of the widely used quartz furnace configuration to fully suppress the sample contamination and obtain identical and clean graphene batches on large areas.
机译:尽管通过化学气相沉积法生长石墨烯是一种可在大面积上确保高结晶度和优异电子性能的生产技术,但对于制造商而言,将生产有效地扩大到工业规模仍然是一个挑战。在这种情况下,存在与石墨烯批料的纯度和可再现性有关的问题,需要解决。特别是在石英炉中生长石墨烯时,通常会导致样品被异质颗粒污染,这会改变生长机理并影响石墨烯的性能。在本文中,我们全面揭示了此类污染物的来源,并解释了它们在生长过程中如何产生。我们还建议对广泛使用的石英炉配置进行修改,以充分抑制样品污染并在大面积上获得相同且清洁的石墨烯批次。

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