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Influence of stress in GaN crystals grown by HVPE on MOCVD-GaN/6H-SiC substrate

机译:HVPE生长的GaN晶体中的应力对MOCVD-GaN / 6H-SiC衬底的影响

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摘要

GaN crystals without cracks were successfully grown on a MOCVD-GaN/6H-SiC (MGS) substrate with a low V/III ratio of 20 at initial growth. With a high V/III ratio of 80 at initial growth, opaque GaN polycrystals were obtained. The structural analysis and optical characterization reveal that stress has a great influence on the growth of the epitaxial films. An atomic level model is used to explain these phenomena during crystal growth. It is found that atomic mobility is retarded by compressive stress and enhanced by tensile stress.
机译:在初始生长时,具有低V / III比20的MOCVD-GaN / 6H-SiC(MGS)衬底上成功生长了无裂纹的GaN晶体。在初始生长时具有80的高V / III比,获得了不透明的GaN多晶。结构分析和光学表征表明,应力对外延膜的生长有很大影响。原子级模型用于解释晶体生长过程中的这些现象。已经发现,原子迁移率受压缩应力的阻碍而受拉伸应力的影响。

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