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首页> 美国卫生研究院文献>Polymers >Synthesis and Thermal Degradation Study of Polyhedral Oligomeric Silsesquioxane (POSS) Modified Phenolic Resin
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Synthesis and Thermal Degradation Study of Polyhedral Oligomeric Silsesquioxane (POSS) Modified Phenolic Resin

机译：多面体低聚硅氧烷（POSS）改性酚醛树脂的合成与热降解研究

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摘要

In this paper, a new polyhedral oligomeric silsesquioxane containing a phenol group (POSS-Phenol) is prepared through the Michael addition reaction, which is added to the synthesis of phenolic resin as a functional monomer. Infrared spectroscopy (IR) is used to demonstrate the chemistry structure of the synthesized POSS modified phenolic resin. After introducing POSS into the resole, a comprehensive study is conducted to reveal the effects of POSS on the thermal degradation of phenolic resin. First, thermal degradation behaviors of neat phenolic resin and modified phenolic resin are carried out by thermogravimetric analysis (TGA). Then, the gas volatiles from thermal degradation are investigated by thermogravimetric mass spectrometry (TG-MS). Finally, the residues after thermal degradation are characterized by X-ray diffraction (XRD). The research indicates that POSS modified phenolic resin shows a better thermal stability than neat phenolic resin, especially at high temperatures under air atmosphere. On the one hand, the introduction of the POSS group can effectively improve the release temperature of oxygen containing volatiles. On the other hand, the POSS group forms silica at high temperatures under air, which can effectively inhibit the thermal oxidation of phenolic resin and make phenolic resin show a better high-temperature oxidation resistance.
机译：在本文中，通过迈克尔加成反应制备含有酚基（POSS-苯酚）的新多面体低聚倍半硅氧烷，其将酚醛树脂作为官能单体的合成加入。红外光谱（IR）用于证明合成的足够改性酚醛树脂的化学结构。在将POSE引入抗牛座后，进行了综合研究，以揭示POSS对酚醛树脂的热降解的影响。首先，通过热重分析（TGA）进行纯酚醛树脂和改性酚醛树脂的热降解行为。然后，通过热重分质谱法（TG-MS）研究了来自热劣化的气体挥发物。最后，热降解后的残留物的特征在于X射线衍射（XRD）。该研究表明，POSS改性酚醛树脂显示出比整齐的酚醛树脂更好的热稳定性，特别是在空气气氛下的高温下。一方面，POSS组的引入可以有效地改善含氧挥发物的释放温度。另一方面，POSS组在空气下的高温下形成二氧化硅，这可以有效抑制酚醛树脂的热氧化，使酚醛树脂显示出更好的高温氧化抗性。

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