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首页> 外文期刊>Advanced Functional Materials >Defect Creation in HKUST-1 via Molecular Imprinting: Attaining Anionic Framework Property and Mesoporosity for Cation Exchange Applications
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Defect Creation in HKUST-1 via Molecular Imprinting: Attaining Anionic Framework Property and Mesoporosity for Cation Exchange Applications

机译：通过分子印迹在HKUST-1中产生缺陷：实现阳离子交换应用的阴离子骨架性能和介孔性

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摘要

Discovering new methods to tailor the physical and chemical properties of metal-organic frameworks (MOFs) for their numerous potential applications is highly desired. In this work, engineering defects in MOF via a molecular imprinting approach is developed to endow HKUST-1, a well-studied classical MOF, with hierarchical structure, mesoporosity, and anionic framework property. Ringlike anionic HKUST-1 (HKUST-1-R) and a wide variety of metal-doped isostructural analogues (M/HKUST-1-R, M = Ca, Cd, Ce, Co, Li, Mn, Na, Ni, or Zn) are obtained. The benefits of transforming imprinted HKUST-1-R to M/HKUST-1-R are further demonstrated for various applications. This synthetic strategy is therefore suitable for rational design and functionalization of MOFs in addition to their morphological control in nanoscale.
机译：迫切需要发现一种新的方法来定制金属有机骨架（MOF）的物理和化学特性，以适应其众多潜在应用。在这项工作中，通过分子印迹方法开发了MOF中的工程缺陷，以赋予HKUST-1（一种经过深入研究的经典MOF）的功能，该结构具有分层结构，介孔性和阴离子骨架性质。环状阴离子HKUST-1（HKUST-1-R）和各种金属掺杂的同构类似物（M / HKUST-1-R，M = Ca，Cd，Ce，Co，Li，Mn，Na，Ni或得到Zn）。将印记的HKUST-1-R转换为M / HKUST-1-R的好处在各种应用中得到了进一步证明。因此，这种合成策略除适用于纳米级的形态控制外，还适用于MOF的合理设计和功能化。

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