• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Advanced Functional Materials >Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques
【24h】

Growth and Properties of Hybrid Organic-Inorganic Metalcone Films Using Molecular Layer Deposition Techniques

机译：分子层沉积技术在有机-无机杂化有机杂化物薄膜中的生长和性能

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Molecular layer deposition (MLD) is a useful technique for fabricating hybrid organic-inorganic thin films. MLD allows for the growth of ultrathin and con-formal films using sequential, self-limiting reactions. This article focuses on the MLD of hybrid organic-inorganic films grown using metal precursors and various organic alcohols that yield metal alkoxide films. This family of metal alkoxides can be described as "metalcones". Many metalcones are possible, such as the "alucones" and "zincones" based on the reaction of trimethy-laluminum and diethylzinc, respectively, with various organic diols such as ethylene glycol. Alloys of the various metalcones with their parent metal oxide atomic layer deposition (ALD) films can also be fabricated that have an organic-inorganic composition that can be adjusted by controlling the relative number of ALD and MLD cycles. These metalcone alloys have tunable chemical, optical, mechanical, and electrical properties that may be useful for designing various functional films. The metalcone hybrid organic-inorganic materials offer a new tool set for engineering thin film properties.
机译：分子层沉积（MLD）是一种用于制造有机-无机杂化薄膜的有用技术。 MLD允许使用顺序的自限反应来生长超薄和保形膜。本文重点介绍了使用金属前驱物和各种可产生金属醇盐膜的有机醇生长的有机-无机杂化膜的MLD。该族的金属醇盐可被描述为“金属锥”。可能有许多金属图标，例如分别基于三甲基铝和二乙基锌与各种有机二醇（例如乙二醇）反应的“铝酮”和“锌酮”。还可制造具有其母体金属氧化物原子层沉积（ALD）膜的各种金属锥体的合金，这些合金具有可通过控制ALD和MLD循环的相对数量进行调节的有机无机成分。这些金属锥合金具有可调谐的化学，光学，机械和电学性质，可用于设计各种功能膜。 Metalcone杂化有机-无机材料为工程薄膜性能提供了新的工具集。

著录项

  • 来源
    《Advanced Functional Materials》 |2013年第5期|532-546|共15页
  • 作者

    Byoung H. Lee; Byunghoon Yoon; Aziz I. Abdulagatov; Robert A. Hall; Steven M. George;

  • 作者单位

    Departments of Chemistry and Chemical Engineering University of Colorado Boulder, CO 80309, USA;

    Departments of Chemistry and Chemical Engineering University of Colorado Boulder, CO 80309, USA;

    Departments of Chemistry and Chemical Engineering University of Colorado Boulder, CO 80309, USA;

    Departments of Chemistry and Chemical Engineering University of Colorado Boulder, CO 80309, USA;

    Departments of Chemistry and Chemical Engineering University of Colorado Boulder, CO 80309, USA;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号