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首页> 外文期刊>Advanced Functional Materials >Synchrotron X-Ray Scanning Tunneling Microscopy: Fingerprinting Near to Far Field Transitions on Cu(111) Induced by Synchrotron Radiation
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Synchrotron X-Ray Scanning Tunneling Microscopy: Fingerprinting Near to Far Field Transitions on Cu(111) Induced by Synchrotron Radiation

机译：同步加速器X射线扫描隧道显微镜：同步辐射引起的Cu（111）上的近到远场转变的指纹。

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摘要

The combination of the high spatial resolution of scanning tunneling microscopy with the chemical and magnetic contrast provided by synchrotron X-rays has the potential to allow a unique characterization of advanced functional materials. While the scanning probe provides the high spatial resolution, synchrotron X-rays that produce photo-excitations of core electrons add chemical and magnetic contrast. However, in order to realize the method's full potential it is essential to maintain tunneling conditions, even while high brilliance X-rays irradiate the sample surface. Different from conventional scanning tunneling microscopy, X-rays can cause a transition of the tip out of the tunneling regime. Monitoring the reaction of the z-piezo (the element that controls the tip to sample separation) alone is not sufficient, because a continuous tip current is obtained. As a solution, an unambiguous and direct way of fingerprinting such near to far field transitions of the tip that relies on the simultaneous analysis of the X-ray-induced tip and sample current is presented. This result is of considerable importance because it opens the path to the ultimate resolution in X-ray enhanced scanning tunneling microscopy.
机译：扫描隧道显微镜的高空间分辨率与同步加速器X射线提供的化学和磁性对比相结合，有可能允许对高级功能材料进行独特的表征。扫描探针提供高空间分辨率时，产生核心电子光激发的同步加速器X射线会增加化学和磁性对比。但是，为了充分发挥该方法的潜力，即使在高亮度X射线照射样品表面时，也必须保持隧穿条件。与传统的扫描隧道显微镜不同，X射线可导致尖端过渡出隧道状态。仅仅监测z压电（控制针尖到样品分离的元素）的反应是不够的，因为可以获得连续的针尖电流。作为解决方案，提出了一种清晰，直接的指纹识别方法，这种方法依赖于对X射线诱导的探针和样品电流的同时分析，从而使探针具有从近到远的转变。该结果非常重要，因为它为X射线增强扫描隧道显微镜提供了最终分辨率的途径。

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  • 来源
    《Advanced Functional Materials》 |2013年第20期|2646-2652|共7页
  • 作者

    Volker Rose; Kangkang Wang; TeYu Chien; Jon Hiller; Daniel Rosenmann; John W. Freeland; Curt Preissner; Saw-Wai Hla;

  • 作者单位

    Advanced Photon Source & Center for Nanoscale Materials Argonne National Laboratory 9700 South Cass Avenue Argonne, IL 60439, USA;

    Center for Nanoscale Materials Argonne National Laboratory 9700 South Cass Avenue, Argonne, IL 60439, USA;

    Advanced Photon Source Argonne National Laboratory 9700 South Cass Avenue, Argonne, IL 60439, USA;

    Electron Microscopy Center Argonne National Laboratory 9700 South Cass Avenue, Argonne, IL 60439, USA;

    Center for Nanoscale Materials Argonne National Laboratory 9700 South Cass Avenue, Argonne, IL 60439, USA;

    Advanced Photon Source Argonne National Laboratory 9700 South Cass Avenue, Argonne, IL 60439, USA;

    Advanced Photon Source Argonne National Laboratory 9700 South Cass Avenue, Argonne, IL 60439, USA;

    Center for Nanoscale Materials Argonne National Laboratory 9700 South Cass Avenue, Argonne, IL 60439, USA;

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