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Conductivity of SU-8 Thin Films through Atomic Force Microscopy Nano-Patterning

机译：SU-8薄膜通过原子力显微镜纳米图案的电导率

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摘要

Processing flexibility and good mechanical properties are the two major reasons for SU-8 extensive applicability in the micro-fabrication of devices. In order to expand its usability down to the nanoscale, conductivity of ultra-thin SU-8 layers as well as its patterning by AFM are explored. By performing local electrical measurements outstanding insulating properties and a dielectric strength 100 times larger than that of SiO_2 are shown. It is also demonstrated that the resist can be nano-patterned using AFM, obtaining minimum dimensions below 40nm and that it can be combined with parallel lithographic methods like UV-lithography. The concurrence of excellent insulating properties and nanometer-scale patternability enables a valuable new approach for the fabrication of nanodevices. As a proof of principle, nano-electrode arrays for electrochemical measurements which show radial diffusion and no overlap between different diffusion layers are fabricated. This indicates the potential of the developed technique for the nanofabrication of devices.
机译：加工灵活性和良好的机械性能是SU-8在设备的微制造中广泛应用的两个主要原因。为了将其可用性扩展到纳米级，研究了超薄SU-8层的导电性及其通过AFM进行的图案化。通过进行局部电学测量，显示了出色的绝缘性能和比SiO_2大100倍的介电强度。还证明了可以使用AFM对抗蚀剂进行纳米构图，获得小于40nm的最小尺寸，并且可以将其与诸如UV光刻的平行光刻方法结合使用。优异的绝缘性能和纳米级可图形性的并存为纳米器件的制造提供了一种有价值的新方法。作为原理的证明，制造了用于电化学测量的纳米电极阵列，其显示出径向扩散并且在不同扩散层之间没有重叠。这表明所开发的技术可用于器件的纳米加工。

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  • 来源
    《Advanced Functional Materials》 |2012年第7期|p.1482-1488|共7页
  • 作者

    Cristina Martin-Olmos; L Guillermo Villanueua; Peter D. van der Wai; Andreu Llobera; Nico F. de Rooij; Juergen Brugger; Francesc Perez-Mumno;

  • 作者单位

    Institut de Microelectronica de Barcelona (CNM-IMB-CSIC)Campus de la Universitat Autonoma de Barcelona E-08193 Bellaterra, Spain,Laboratory of Microsystems Ecole Polytechnique Federale de Lausanne (EPFL) CH-1015 Lausanne, Switzerland;

    Laboratory of Microsystems Ecole Polytechnique Federale de Lausanne (EPFL) CH-1015 Lausanne, Switzerland;

    Sensors, Actuators and Microsystems Laboratory Ecole Polytechnique Fecleale de Lausanne (EPFL) CH-2002 Neuchatel, Switzerland;

    Institut de Microelectronica de Barcelona (CNM-IMB-CSIC)Campus de la Universitat Autonoma de Barcelona E-08193 Bellaterra, Spain;

    Sensors, Actuators and Microsystems Laboratory Ecole Polytechnique Fecleale de Lausanne (EPFL) CH-2002 Neuchatel, Switzerland;

    Laboratory of Microsystems Ecole Polytechnique Federale de Lausanne (EPFL) CH-1015 Lausanne, Switzerland;

    Institut de Microelectronica de Barcelona (CNM-IMB-CSIC)Campus de la Universitat Autonoma de Barcelona E-08193 Bellaterra, Spain;

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