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首页> 外文期刊>Advanced Functional Materials >Dual-Tone Patterned Mesoporous Silicate Films Templated From Chemically Amplified Block Copolymers
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Dual-Tone Patterned Mesoporous Silicate Films Templated From Chemically Amplified Block Copolymers

机译：以化学放大嵌段共聚物为模板的双音图案介孔硅酸盐薄膜

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摘要

Directly patterned mesoporous silicate films are prepared using positive- and negative-tone strategies by performing phase selective silica condensation within lithographically exposed poly(styrene-b-tert-butyl acrylate) (PS-b-PtbA) templates containing photoacid generators. The use of supercritical fluid as a process medium enables rapid diffusion of the silicate precursor within the prepatterned block copolymer template film without disrupting its morphology. Template exposure through the mask triggers area selective generation of acid, which in turn both deprotects the poly(tert-butyl acrylate) block to yield a poly(acrylic acid) block and provides a catalyst for silica precursor condensation yielding pattern formation at the device level. Because the acid generated in the UV exposed field preferentially segregates into hydrophilic poly(acrylic acid) domains of the phase segregated, deprotected block copolymer, precursor condensation is simultaneously controlled at nanoscopic length scales via templating by the underlying block copolymer morphology. The ability of PS-b-PtbA to undergo chemical transformation in two stages, deprotection followed by crosslinking, enables precise replications of the photomask in positive and negative tones. Detemplating via calcination yields patterned mesoporous silicate films without etching. Template formulations are optimized using infrared spectroscopic studies and the silicate films are characterized using electron microscopy and scanning force microscopy.
机译：通过在包含光酸产生剂的光刻曝光的聚（苯乙烯-b-叔丁基丙烯酸酯）（PS-b-PtbA）模板中进行相选择二氧化硅缩合，可使用正负方法制备直接构图的介孔硅酸盐薄膜。使用超临界流体作为处理介质能够使硅酸盐前体在预图案化的嵌段共聚物模板膜内快速扩散，而不会破坏其形态。通过掩模进行模板曝光会触发区域选择性产生酸，继而使聚（丙烯酸叔丁酯）嵌段脱保护，生成聚（丙烯酸）嵌段，并为二氧化硅前体缩合提供催化剂，从而在器件级形成图案。因为在UV暴露场中生成的酸优先偏析到相分离的脱保护的嵌段共聚物的亲水性聚（丙烯酸）域中，所以通过基础嵌段共聚物的形态进行模板化，同时将前体缩合控制在纳米级的尺度上。 PS-b-PtbA分两个阶段进行化学转化的能力（脱保护然后交联）使得能够以正色调和负色调精确复制光掩模。通过煅烧减模得到图案化的介孔硅酸盐膜而没有蚀刻。使用红外光谱研究优化了模板配方，并使用电子显微镜和扫描力显微镜对硅酸盐薄膜进行了表征。

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  • 来源
    《Advanced Functional Materials》 |2009年第17期|2728-2734|共7页
  • 作者

    Sivakumar Nagarajan; Thomas P. Russell; James J. Watkins;

  • 作者单位

    Department of Polymer Science and Engineering University of Massachusetts Amherst, MA 01003 (USA) Materials Technology Development Croup Intel Corporation Chandler, AZ 85226 (USA);

    Department of Polymer Science and Engineering University of Massachusetts Amherst, MA 01003 (USA);

    Department of Polymer Science and Engineering University of Massachusetts Amherst, MA 01003 (USA);

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