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Chiral Nematic Fluids as Masks for Lithography

机译:手性向列液作为光刻掩模

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摘要

Diffractive optics has attracted a great deal of interest due to its promising applications in the field of optics and optical communications. However, the utility of diffractive optics in technological applications is primarily limited by the significant time and equipment costs associated with the typical fabrication methods. A number of groups have explored the use of simple techniques based on PostScript[1] printing to reduce the time and cost of fabrication of such diffractive elements.[2,3] While such methods have produced impressive results, they are not dynamic in nature. In the quest for such a mask to fabricate diffractive optical elements over large areas, we were attracted to the "mask" inherent in chiral nematic liquid crystals and demonstrate that such liquid crystals can be used as masks to fabricate diffractive optical elements.
机译:衍射光学由于其在光学和光通信领域的广阔应用前景而引起了人们的极大兴趣。然而,衍射光学在技术应用中的实用性主要受到与典型制造方法相关的大量时间和设备成本的限制。许多小组已经探索了基于PostScript [1]打印的简单技术的使用,以减少制造这种衍射元件的时间和成本。[2,3]尽管这些方法产生了令人印象深刻的结果,但它们本质上并不是动态的。为了寻求在大面积上制造衍射光学元件的掩模,我们被手性向列液晶固有的“掩模”所吸引,并证明了这种液晶可以用作制造衍射光学元件的掩模。

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  • 来源
    《Advanced Materials》 |2012年第3期|p.381-384|共4页
  • 作者单位

    Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology Daejeon 305-701, Korea;

    Information and Electronics Polymer Research Center Korea Research Institution of Chemical Technology 141 Gajeong-ro, Yuseong-gu, Daejeon, 305-600, Korea;

    Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology Daejeon 305-701, Korea;

    Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology Daejeon 305-701, Korea;

    School of Materials Science and Engineering School of Chemistry and Biochemistry Center for Advanced Research on Optical Microscopy (CAROM) Georgia Institute of Technology Atlanta, Georgia 30332, USA;

    Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology Daejeon 305-701, Korea;

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