Influence of ultrathin amorphous silicon layers on the nucleation of microcrystalline silicon films under hydrogen plasma treatment

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• 来源
  《Applied Physics Letters》 |2011年第4期|p.041902.1-041902.3|共3页
• 作者

  Z. W. Zuo; W. T. Guan; Y. Wang; J. Lu; J. Z. Wang; L. Pu; Y. Shi; Y. D. Zheng; X. Y. Luo; H. H. Wang;

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• 作者单位

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  School of Electronic Science and Engineering, Key Laboratory of Photonic and Electronic Materials,Nanjing University, Nanjing 210093, People's Republic of China;

  Beijing Synchrotron Radiation Laboratory, Institute of High Energy Physics, Beijing 100049,People's Republic of China;

  Beijing Synchrotron Radiation Laboratory, Institute of High Energy Physics, Beijing 100049,People's Republic of China;

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