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首页> 外文期刊>Applied Physics Letters >Increased photoluminescence of strain-reduced, high-Sn composition Ge_(1-x) Sn_x alloys grown by molecular beam epitaxy
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Increased photoluminescence of strain-reduced, high-Sn composition Ge_(1-x) Sn_x alloys grown by molecular beam epitaxy

机译:通过分子束外延生长增加应变降低的高Sn组成Ge_(1-x)Sn_x合金的光致发光

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摘要

We synthesized up to Ge_(0.914)Sn_(0.086) alloys on (100) GaAs/In_yGa_(1-x)As buffer layers using molecular beam epitaxy. The buffer layers-enable engineered control of strain in the Ge_(1-x)Sn_x layers to reduce strain-related defects and precipitation. Samples grown under similar conditions show a monotonic increase in the integrated photoluminescence (PL) intensity as the Sn composition is increased, indicating changes in the bandstructure faVorable for optoelectronics. We account for bandgap changes from strain and composition to determine a direct bandgap bowing parameter of b = 2.1 ±0.1. According to our models, these are the first Ge_(1-x)Sn_x samples that are both direct-bandgap and exhibit PL.
机译:我们使用分子束外延在(100)GaAs / In_yGa_(1-x)As缓冲层上合成了多达Ge_(0.914)Sn_(0.086)合金。缓冲层可对Ge_(1-x)Sn_x层中的应变进行工程控制,以减少与应变相关的缺陷和沉淀。在相似条件下生长的样品显示,随着Sn组成的增加,积分光致发光(PL)强度会单调增加,这表明光电子的能带结构发生了变化。我们考虑了应变和成分的带隙变化,以确定直接带隙弯曲参数b = 2.1±0.1。根据我们的模型,这是第一个Ge_(1-x)Sn_x样本,它们都是直接带隙且显示PL。

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  • 来源
    《Applied Physics Letters》 |2011年第18期|p.181125.1-181125.3|共3页
  • 作者单位

    Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;

    Stanford Nano Center (SNC), Stanford University, Stanford, California 94305, USA;

    Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;

    Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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