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首页> 外文期刊>Applied Physicsletters >Deposition of sol-gel derived lead lanthanum zirconate titanate thin films on copper substrates
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Deposition of sol-gel derived lead lanthanum zirconate titanate thin films on copper substrates

机译:溶胶-凝胶法在铜基底上沉积锆钛酸镧镧铅薄膜

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摘要

Lead lanthanum zirconate titanate (PLZT) thin films were directly deposited on copper substrates by chemical solution deposition and crystallized at temperatures of ≥ 650 ℃ under low pO_2 conditions. Although the crystallization conditions used are conducive for copper oxidation, a thin layer (~115 nm) of PLZT was sufficient to protect the underlying copper from oxidation. Films exhibited well saturated hysteresis loops with remanent polarization ~24 μC/cm~2 and dielectric constants ~730. Indirect evidence suggests that the oxygen vacancies created during the high temperature processing are responsible for the degradation of the electrical properties of these thin films. Techniques for avoiding this problem are proposed.
机译:钛酸锆钛酸铅(PLZT)薄膜通过化学溶液沉积直接沉积在铜基板上,并在低pO_2条件下在≥650℃的温度下结晶。尽管所用的结晶条件有利于铜的氧化,但PLZT的薄层(约115 nm)足以保护下面的铜不被氧化。薄膜表现出良好的饱和磁滞回线,剩余极化率为〜24μC/ cm〜2,介电常数为〜730。间接证据表明,高温处理过程中产生的氧空位是造成这些薄膜电性能下降的原因。提出了避免该问题的技术。

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