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首页> 外文期刊>Applied Physics >Characteristics of low-resistivity aluminum-doped zinc oxide films deposited at room temperature by off-axis radio-frequency sputtering on flexible plastic substrates
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Characteristics of low-resistivity aluminum-doped zinc oxide films deposited at room temperature by off-axis radio-frequency sputtering on flexible plastic substrates

机译:室温下通过离轴射频溅射在柔性塑料基板上沉积的低电阻铝掺杂氧化锌薄膜的特性

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摘要

The crystalline structure, morphology, composition, electrical transport, and optical properties of aluminum-doped zinc oxide (AZO) films are studied for applications in transparent electronics and optoelectronic devices. AZO thin films of c-axis-oriented growth and with different thickness were deposited on PET flexible plastic substrates at room temperature by rf magnetron sputtering. A larger grain size with a decreased strain e value is observed in a thicker film, while changes in composition for films with different thicknesses are insignificant. Moreover, the resistivity of film decreases with increasing thickness, and the low-temperature electrical transport properties can be described by the scenario of quantum corrections to conductivity. With the room-temperature growth conditions, the resistivity of 4.5 × 10~(-4) Ω cm, carrier concentration of 6.4 × 10~(20) cm~(-3), and transmit-tance of 80 % for the 1100-nm-thick film are obtained. In addition, the optical bandgap energy decreases with increasing film thickness, which can be attributed to the bandgap renormalization and crystallite size effects.
机译:研究了掺铝氧化锌(AZO)膜的晶体结构,形态,组成,电传输和光学性质,以用于透明电子和光电器件中。在室温下,通过射频磁控溅射将cZO取向生长且厚度不同的AZO薄膜沉积在PET柔性塑料基板上。在较厚的薄膜中观察到较大的晶粒尺寸,且应变e值降低,而不同厚度的薄膜的成分变化不明显。而且,膜的电阻率随着厚度的增加而减小,并且低温电传输特性可以通过对电导率进行量子校正的情况来描述。在室温下,1100-1100的电阻率为4.5×10〜(-4)Ωcm,载流子浓度为6.4×10〜(20)cm〜(-3),透射率为80%获得了nm厚的膜。另外,光学带隙能量随着膜厚度的增加而减小,这可以归因于带隙重归一化和微晶尺寸效应。

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  • 来源
    《Applied Physics》 |2016年第8期|731.1-731.11|共11页
  • 作者单位

    Department of Physics/Graduate Institute of Applied Physics, National Taiwan University, Taipei 10617, Taiwan;

    Department of Physics/Graduate Institute of Applied Physics, National Taiwan University, Taipei 10617, Taiwan;

    Institute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei 11677, Taiwan;

    Institute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei 11677, Taiwan;

    Institute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei 11677, Taiwan;

    Institute of Electro-Optical Science and Technology, National Taiwan Normal University, Taipei 11677, Taiwan;

    National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan;

    National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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