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Electrodeposition mechanism of quaternary compounds Cu2ZnSnS4: Effect of the additives

机译：四元化合物Cu2ZnSnS4的电沉积机理：添加剂的影响

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摘要

The electrodeposition mechanism of pure phase Cu2ZnSnS4 (CZTS) thin film with subsequent annealing was investigated in detail. An electrolyte design principle of quaternary compounds was proposed. The complex ions of Cu(H2C6H5O7)(+), Cu-2(C6H5O7)(+), Zn(C4H5O6)(+), Sn(H2C6H5O7)(+) and Sn-2(C6H5O7)(+), which influenced the reduction process and played important roles in co-deposition, were identified by UV spectra. Electrochemical studies indicated that trisodium citrate and tartaric acid could narrow the co-deposition potential range of the four elements to -0.8 V to -1.2 V (vs. SCE). The cause was the synergetic effect that trisodium citrate inhibited the reduction of Cu2+ and Sn2+ and tartaric acid promoted the reduction of Zn2+. The reduction of S2O32- was mainly attributed to the induction effect of the metallic ions, and the H+ dissociated from tartaric acid could also promote the cathode process of S2O32-. The reaction mechanism could be summarized as the following steps: (I) Cu(H2C6H5O7)(+), Cu-2(C6H5O7)(+) -> Cu, Sn(H2C6H5O7)(+), Sn-2(C6H5O7)(+) -> Sn, Zn(C4H5O6)(+) -> Zn; (II) the desorption of (H2C6H5O7)(-) and (C6H5O7)(-), and the reduction of S2O32- induced by metallic ions and H+. The mechanism studies provided a path of electrolyte design for multicomponent compounds. (C) 2017 Published by Elsevier B.V.
机译：详细研究了纯相Cu2ZnSnS4（CZTS）薄膜及其后续退火的电沉积机理。提出了季化合物的电解质设计原理。 Cu（H2C6H5O7）（+），Cu-2（C6H5O7）（+），Zn（C4H5O6）（+），Sn（H2C6H5O7）（+）和Sn-2（C6H5O7）（+）的络离子通过紫外光谱确定了还原过程并在共沉积中起重要作用。电化学研究表明，柠檬酸三钠和酒石酸可以将这四个元素的共沉积电位范围缩小至-0.8 V至-1.2 V（相对于SCE）。原因是协同作用柠檬酸三钠抑制了Cu2 +和Sn2 +的还原，酒石酸促进了Zn2 +的还原。 S2O32-的还原主要归因于金属离子的诱导作用，酒石酸离解的H +也可以促进S2O32-的阴极过程。反应机理可归纳为以下步骤：（I）Cu（H2C6H5O7）（+），Cu-2（C6H5O7）（+）-> Cu，Sn（H2C6H5O7）（+），Sn-2（C6H5O7）（ +）-> Sn，Zn（C4H5O6）（+）-> Zn; （II）（H2C6H5O7）（-）和（C6H5O7）（-）的解吸，以及金属离子和H +引起的S2O32-的还原。机理研究为多组分化合物的电解质设计提供了一条途径。 （C）2017由Elsevier B.V.发布

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  • 来源
    《Applied Surface Science》 |2018年第ptaa期|267-275|共9页
  • 作者

    Tang Aiyue; Li Zhilin; Wang Feng; Dou Meiling; Liu Jingjun; Ji Jing; Song Ye;

  • 作者单位

    Beijing Univ Chem Technol, Beijing Key Lab Electrochem Proc & Technol Mat, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China;

    Beijing Univ Chem Technol, Beijing Key Lab Electrochem Proc & Technol Mat, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China;

    Beijing Univ Chem Technol, Beijing Key Lab Electrochem Proc & Technol Mat, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China;

    Beijing Univ Chem Technol, Beijing Key Lab Electrochem Proc & Technol Mat, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China;

    Beijing Univ Chem Technol, Beijing Key Lab Electrochem Proc & Technol Mat, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China;

    Beijing Univ Chem Technol, Beijing Key Lab Electrochem Proc & Technol Mat, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China;

    Beijing Univ Chem Technol, Beijing Key Lab Electrochem Proc & Technol Mat, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China;

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  • 关键词

    Cu2ZnSnS4; Electrode position mechanism; Trisodium citrate; Tartaric acid; Synergetic effect;

    机译：Cu2ZnSnS4电沉积机理柠檬酸三钠酒石酸协同效应;

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