Growth kinetics and microstructure of MOCVD iridium coating from iridium(III) acetylacetonate with hydrogen

Yang Shirui; Yu Xiaodong; Tan Chengwen; Wang Yandong; Ma Honglei; Liu Kexue; Cai Hongnian

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Growth kinetics and microstructure of MOCVD iridium coating from iridium(III) acetylacetonate with hydrogen

机译：乙酰丙酮铱（III）与氢的MOCVD铱涂层的生长动力学和微观结构

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Iridium coatings were produced by metallo-organic chemical vapor deposition (MOCVD) using iridium(III) acetylacetonate (Ir(acac)(3)) as precursor at 400-520 degrees C under atmospheric pressure in the presence of hydrogen. Three different deposition regions were obtained in the study: reaction-rate-limited regions at intermediate (460-500 degrees C), low (<460 degrees C), and high (520, and 540 degrees C) temperatures. The steady-state kinetics of iridium deposition was studied as functions of temperature and hydrogen pressure at intermediate temperatures, which could be described with the Rideal-Elay kinetic model. This model indicates that the hydrogen in the air is activated and reacts with the Ir(acac)3 molecules adsorbed on the surface. At high temperatures, growth velocity was changed into the relation dependent more on deposition temperature and hydrogen partial pressure, while at low temperatures stable deposition results could not be obtained in the system. The coating microstructure strongly depended on deposition temperature and hydrogen pressure. The coatings surfaces show an even topography in the reaction-limited regions and uneven ones at low or high deposition temperatures. The grain size increased with decreased temperature or decreased hydrogen pressure at 400-500 degrees C. (C) 2014 Elsevier B.V. All rights reserved.

机译：铱涂层是通过金属有机化学气相沉积（MOCVD）使用乙酰丙酮铱（III）（Ir（acac）（3））作为前体在大气压力和氢气存在下于400-520摄氏度下生产的。在研究中获得了三个不同的沉积区域：中间温度（460-500摄氏度），低温（<460摄氏度）和高温（520和540摄氏度）的反应速率限制区域。研究了在中等温度下铱沉积的稳态动力学与温度和氢气压力的关系，可以用Rideal-Elay动力学模型来描述。该模型表明空气中的氢被活化并与吸附在表面上的Ir（acac）3分子发生反应。在高温下，生长速度变为更多地取决于沉积温度和氢分压的关系，而在低温下，系统中无法获得稳定的沉积结果。涂层的微观结构在很大程度上取决于沉积温度和氢气压力。涂层表面在反应受限区域显示出均匀的形貌，在低或高沉积温度下显示出不均匀的形貌。晶粒尺寸随着温度降低或氢气压力降低在400-500摄氏度而增加。（C）2014 Elsevier B.V.保留所有权利。

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来源
《Applied Surface Science》 |2015年第28期|248-255|共8页
作者
Yang Shirui; Yu Xiaodong; Tan Chengwen; Wang Yandong; Ma Honglei; Liu Kexue; Cai Hongnian;
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Beijing Inst Technol, Sch Mat Sci & Engn, Beijing 100081, Peoples R China|China Astronaut Res & Training Ctr, Beijing 86100081, Peoples R China;

Beijing Inst Technol, Sch Mat Sci & Engn, Beijing 100081, Peoples R China|China Astronaut Res & Training Ctr, Beijing 86100081, Peoples R China;

Beijing Inst Technol, Sch Mat Sci & Engn, Beijing 100081, Peoples R China|China Astronaut Res & Training Ctr, Beijing 86100081, Peoples R China;

Beijing Inst Technol, Sch Mat Sci & Engn, Beijing 100081, Peoples R China|Univ Sci & Technol Beijing, Beijing 86100083, Peoples R China;

Beijing Inst Technol, Sch Mat Sci & Engn, Beijing 100081, Peoples R China|China Astronaut Res & Training Ctr, Beijing 86100081, Peoples R China;

Beijing Inst Technol, Sch Mat Sci & Engn, Beijing 100081, Peoples R China|China Astronaut Res & Training Ctr, Beijing 86100081, Peoples R China;

Beijing Inst Technol, Sch Mat Sci & Engn, Beijing 100081, Peoples R China;

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正文语种 eng
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关键词
MOCVD; Iridium; Coating; Hydrogen reduction; Iridium(III) acetylacetonate;

机译：MOCVD;铱;涂层;氢还原;乙酰丙酮铱（III）;

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Growth kinetics and microstructure of MOCVD iridium coating from iridium(III) acetylacetonate with hydrogen

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