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首页> 外文期刊>Applied Surface Science >Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma
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Photocatalytic property of titanium dioxide thin films deposited by radio frequency magnetron sputtering in argon and water vapour plasma

机译：射频磁控溅射在氩气和水蒸气等离子体中沉积的二氧化钛薄膜的光催化性能

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摘要

The present work is investigating the photocatalytic activity of TiO2 thin films deposited by radiofrequency magnetron sputtering of a pure TiO2 target in Ar and Ar/H2O (pressure ratio 40/3) plasmas. Optical absorption, structure, surface morphology and chemical structure of the deposited films were comparatively studied. The films were amorphous and included a large amount of hydroxyl groups (about 5% of oxygen atoms were bounded to hydrogen) irrespective of the intentional content of water in the deposition chamber. Incorporation of hydroxyl groups in the film deposited in pure Ar plasma is explained as contamination of the working gas with water molecules desorbed by plasma from the deposition chamber walls. However, intentional input of water vapour into the discharge chamber decreased the deposition speed and roughness of the deposited films. The good photocatalytic activity of the deposited films could be attributed hydroxyl groups in their structures. (C) 2015 Elsevier B.V. All rights reserved.
机译：目前的工作是研究通过射频磁控溅射在Ar和Ar / H2O（压力比40/3）等离子中对纯TiO2靶进行射频磁控溅射沉积的TiO2薄膜的光催化活性。对沉积膜的光吸收，结构，表面形貌和化学结构进行了比较研究。该膜是无定形的，并且包括大量的羟基（约5％的氧原子与氢键合），而与沉积室中水的故意含量无关。在纯Ar等离子体中沉积的薄膜中掺入羟基被解释为工作气体被等离子体从沉积室壁上解吸的水分子污染。但是，有意将水蒸气输入放电室会降低沉积速度和沉积膜的粗糙度。沉积膜的良好光催化活性可以归因于其结构中的羟基。 （C）2015 Elsevier B.V.保留所有权利。

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