Comparative studies on damages to organic layer during the deposition of ITO films by various sputtering methods

著录项

• 来源
  《Applied Surface Science》 |2013年第ptab期|389-394|共6页
• 作者

  Hao Lei; Meihan Wang; Yoichi Hoshi; Takayuki Uchida; Shinichi Kobayashi; Yutaka Sawada;

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• 作者单位

  State Key Laboratory for Corrosion and Protection, Division of Surface Engineering of Materials, Institute of Metal Research,Chinese Academy of Sciences, Shenyang 110016, PR China;

  College of Mechanical Engineering, Shenyang University, Shenyang 110044, PR China;

  Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;

  Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;

  Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;

  Center for Hyper Media Research, Tokyo Polytechnic University, 1583 liyama, Atsugi, Kanagawa 243-0297, Japan;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  Damage to organic layer; Magnetron sputtering (MS); Low voltage sputtering (LVS); Kinetic-energy-control-deposition (KECD); Facing target sputtering (FTS); PL spectra;

  机译：破坏有机层;磁控溅射（MS）;低压溅射（LVS）;动能控制沉积（KECD）;面对靶溅射（FTS）;PL光谱;