首页> 外文期刊>Applied Surface Science >Influence of substrate temperature on structural, morphological and electrical properties of La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_3 thin films for IT-SOFCs
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Influence of substrate temperature on structural, morphological and electrical properties of La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_3 thin films for IT-SOFCs

机译:衬底温度对IT-SOFCs La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_3薄膜的结构,形态和电学性能的影响

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摘要

The crack free, homogeneous, nanocrystalline La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_3 thin films have been deposited on Ce_(0.9)Gd_(0.1)O_(1.95) electrolyte by the spray pyrolysis technique. The films with typically 1-2 μm thickness, get crystallized on annealing at 800 ℃. In the present work, the effect of substrate temperature on microstructure, crystallization and conductivity has been systematically studied. The deposition of film at 300 ℃ shows higher in plane electrical conductivity of 26.6 S cm~(-1) with activation energy, E_a = 0.23 eV. The higher conductivity attributes to uniform, thin and dense microstructure of thin films. No interfa-cial reaction products between La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_3 and Ce_(0.9)Gd_(0.1)O_(1.95) were detected upon annealing at 800℃/4h. The uniformity and porosity distribution as a function of deposition temperature clarified from Scanning Electron micrograph.
机译:通过喷雾热解技术在Ce_(0.9)Gd_(0.1)O_(1.95)电解质上沉积了无裂纹,均质的纳米晶La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_3薄膜。通常具有1-2μm厚度的薄膜在800℃退火时会结晶。在目前的工作中,已经系统地研究了衬底温度对微观结构,结晶和电导率的影响。在300℃下沉积的薄膜在活化能为E_a = 0.23 eV时具有26.6 S cm〜(-1)的较高平面电导率。较高的电导率归因于薄膜的均匀,薄而致密的微观结构。在800℃/ 4h退火后,未检测到La_(0.6)Sr_(0.4)Co_(0.2)Fe_(0.8)O_3与Ce_(0.9)Gd_(0.1)O_(1.95)之间的界面反应产物。均匀性和孔隙率分布随沉积温度的变化由扫描电子显微照片阐明。

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