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首页> 外文期刊>Applied Surface Science >Effect of annealing on photoluminescence and optical properties of porous anodic alumina films formed in sulfuric acid for solar energy applications
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Effect of annealing on photoluminescence and optical properties of porous anodic alumina films formed in sulfuric acid for solar energy applications

机译：退火对用于太阳能的硫酸中形成的多孔阳极氧化铝膜的光致发光和光学性能的影响

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摘要

Photoluminescence and optical properties of porous oxide films formed by two-step aluminum anodiza-tion at a fixed current 200 mA have been investigated. It was found that the crystallographic structure depend strongly on the annealing temperature. X-ray diffraction (XRD) reveals an amorphisation of the porous oxide films after annealing. This evolution has been confirmed by Raman spectroscopy measurement. Spectroscopic ellipsometry (SE) in the UV-vis and near infra red (IR) spectra shows that refraction index n increases and the extinction coefficient k decreases with annealing temperature. This observation has been confirmed with reflectivity measurements. As a consequence the reflectivity reaches 97% when porous alumina films were annealed at 650℃. Photoluminescence (PL) measurements show two PL peaks in the emission and excitation spectra. The first emission peak is centered at 460 nm (a-band) and the second (P-band) shifts from 500 to 525 nm, depending on excitation wavelength. For excitation spectra, one spectral peak is located at 271 nm and the second shifts to longer wavelengths with increasing emission wavelength. The results indicate the existence of two PL centers. One is associated with oxygen adsorption at the pore wall and oxygen vacancies inside the alumina. The other is related to the adsorption of water and/or OH groups at the surface of the pore wall and to structure defects and sulfur inclusion inside the films.
机译：研究了在200 mA的固定电流下通过两步铝阳极氧化形成的多孔氧化膜的光致发光和光学特性。发现晶体结构强烈依赖于退火温度。 X射线衍射（XRD）显示了退火后多孔氧化膜的非晶化。通过拉曼光谱测量已经证实了这种演变。在紫外可见光谱和近红外光谱中的椭圆偏振光谱法（SE）表明，随着退火温度的升高，折射率n增大，消光系数k减小。该观察结果已经通过反射率测量得到证实。结果，当多孔氧化铝膜在650℃退火时，反射率达到97％。光致发光（PL）测量显示了发射光谱和激发光谱中的两个PL峰。根据激发波长，第一个发射峰的中心为460 nm（a波段），第二个发射峰（P波段）从500 nm转变为525 nm。对于激发光谱，一个光谱峰位于271 nm，第二个光谱峰随发射波长的增加而移至更长的波长。结果表明存在两个PL中心。一种与在孔壁处的氧吸附和氧化铝内部的氧空位有关。另一个与孔壁表面上水和/或OH基的吸附有关，与膜内部的结构缺陷和硫的夹杂有关。

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  • 来源
    《Applied Surface Science》 |2012年第12期|p.4995-5000|共6页
  • 作者

    Mondher Ghrib; Rachid Ouertani; Monir Gaidi; Najoua Khedher; Mohamed Ben Salem; Hatem Ezzaouia;

  • 作者单位

    Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;

    Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;

    Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;

    Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;

    L3M, Department of Physics, Faculty of Sciences of Bizerte, 7021 Zarzouna, Tunisia;

    Photovoltaic Laboratory Research and Technology Centre of Energy, Borj-Cedria Science and Technology Park, BP 95,2050 Hammam-Lif, Tunisia;

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  • 正文语种 eng
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  • 关键词

    porous oxide films; annealing; photoluminescence; ellipsometry; reflectivity;

    机译：多孔氧化膜退火;光致发光椭圆仪反射率;

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