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Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions

机译：等离子体聚焦装置在不同轴向和角度位置沉积氮化钨薄膜

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摘要

Tungsten nitride thin films were deposited on stainless steel-304 substrates by using a low energy (2kJ) Mather type plasma focus device. X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM) and microhardness are used to study the surface of treated samples. The XRD analysis shows that the degree of crystallinity of deposited thin films strongly depends on axial and angular positions of samples. The SEM micrographs of the deposited films at different angular positions (0°, 10° and 30°) and axial position of 8 cm show that the content of WN sub-micro crystalline structures on the surface of deposited films decreased with increasing the angle with respect to anode axis. From AFM results we observe that for the sample deposited at 8 cm and 0° axial and angular positions, respectively, the most uniform surface and the most homogenous distribution of grains are obtained. Also the hardness results show that the highest mechanical hardness is obtained when the film is deposited at 8 cm and 0° axial and angular positions, respectively.
机译：通过使用低能量（2kJ）Mather型等离子聚焦装置将氮化钨薄膜沉积在304不锈钢基底上。 X射线衍射（XRD），扫描电子显微镜（SEM），原子力显微镜（AFM）和显微硬度用于研究处理过的样品的表面。 XRD分析表明，沉积薄膜的结晶度强烈取决于样品的轴向和角位置。在不同角度位置（0°，10°和30°）和轴向位置为8 cm的沉积膜的SEM显微照片显示，沉积膜表面上的WN亚微晶结构的含量随着角度的增加而降低。相对于阳极轴。根据原子力显微镜的结果，我们观察到分别在8 cm和0°轴向和角度位置沉积的样品，可获得最均匀的表面和最均匀的晶粒分布。硬度结果还表明，当膜分别在8 cm和0°轴向和角度位置沉积时，可获得最高的机械硬度。

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  • 来源
    《Applied Surface Science》 |2011年第17期|p.7653-7658|共6页
  • 作者

    M.T.Hosseinnejad; M.Ghoranneviss; G.R.Etaati; M.Shirazi; Z.Ghorannevis;

  • 作者单位

    Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran;

    Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran;

    Nuclear Engineering and Physics Department, Amir Kabir University of Technology, Tehran, Iran;

    Physics Department, Faculty of Science, Arak University, Arak, Iran;

    Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    plasma focus; tungsten nitride; thin film; xrd; sem; afm;

    机译：等离子聚焦氮化钨薄膜;xrd;sem;AFM;

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