Applied Surface Science Zirconium-Assisted Reaction In Low Temperature Atomic Layer Deposition Using Bis(Ethyl-Methyl-Amino)Silane And Water

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Applied Surface Science Zirconium-Assisted Reaction In Low Temperature Atomic Layer Deposition Using Bis(Ethyl-Methyl-Amino)Silane And Water

机译：双（乙基-甲基-氨基）硅烷和水在低温原子层沉积中应用表面科学锆辅助反应

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The reaction of Bis(ethyl-methyl-amino)silane (BEMAS) and water in atomic layer deposition (AL.D) became possible when Zr-containing species were adsorbed on the vacant sites of the surface after a pulse and purge of BEMAS. The growth rates of the Si(Zr)O_x films were 0.8-0.9 nm/cycle in the temperature range of 185-325 °C. This phenomenon probably originates from the highly reactive hydroxyl species generated by Zr atoms. From this point of view, transition metals make reactant gas molecules to be highly activated in the ALD processes of transition metal oxides and nitrides, which might be an important factor that determines the ALD characteristics.

机译：在脉冲和吹扫BEMAS之后，将含Zr的物质吸附在表面的空位上时，双（乙基-甲基-氨基）硅烷（BEMAS）与水的反应就可能在原子层沉积（AL.D）中进行。 Si（Zr）O_x薄膜在185-325°C的温度范围内的生长速率为0.8-0.9 nm /循环。这种现象可能源自Zr原子产生的高反应性羟基。从这个角度来看，过渡金属使反应气体分子在过渡金属氧化物和氮化物的ALD过程中被高度活化，这可能是决定ALD特性的重要因素。

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《Applied Surface Science》 |2011年第23期|p.10311-10313|共3页
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正文语种 eng
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Atomic layer deposition; Silicate; Hydroxyl; Transition metal;

机译：原子层沉积;硅酸盐;羟基;过渡金属;

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机译：用水进行TiO_2原子层沉积中TiCp〜*（OMe）_3对Ti（OMe）_4与Ti（OMe）_4的关系-原子层沉积表面反应的从头算建模
2. Surface and sub-surface reactions during low temperature aluminium oxide atomic layer deposition on fiber-forming polymers [J] . Joseph C. Spagnola, Bo Gong, Sara A. Arvidson Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2010,第20期

机译：低温氧化铝原子层沉积在成纤聚合物上的表面和次表面反应
3. Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N-2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy [J] . Bosch Roger H. E. C., Cornelissen Lidewij E., Knoops Harm C. M., Chemistry of Materials: A Publication of the American Chemistry Society . 2016,第16期

机译：原位气相和表面红外光谱研究双（叔丁基氨基）硅烷和N-2等离子体中氮化硅的原子层沉积
4. Low-temperature-atomic-layer-deposition of SiO_2 with Tris(dimethvlamino)silane (TDMAS) and Ozone using Temperature Controlled Water Vapor Treatment [C] . F. Hirose, Y. Kinoshita, S.Shibuya, International symposium on silicon nitride, silicon dioxide, and emerging dielectrics;Meeting of the Electrochemical Society . 2009

机译：三（二甲基氨基）硅烷（TDMAS）和臭氧的温控水蒸气处理SiO_2的低温原子层沉积
5. Preparation of Silver Catalysts by Atomic Layer Deposition and Studies of Atomic Layer Deposition Reactions Using Operando Surface-Enhanced Raman Spectroscopy. [D] . Masango, Sicelo Simon. 2015

机译：通过原子层沉积制备银催化剂以及使用Operando表面增强拉曼光谱研究原子层沉积反应。
6. Self-cleaning and surface chemical reactions during hafnium dioxide atomic layer deposition on indium arsenide [O] . Rainer Timm, Ashley R. Head, Sofie Yngman, -1

机译：二氧化ha原子层沉积在砷化铟上的自清洁和表面化学反应
7. Atomic Layer Deposition of Silicon Nitride from Bis(tertiary-butyl-amino)silane and N2 Plasma Studied by in Situ Gas Phase and Surface Infrared Spectroscopy [O] . -1

机译：由双（叔丁基 - 氨基）硅烷和N 2血浆的原子层沉积来自原位气相和表面红外光谱研究的硅烷和N2等离子体
8. Surface Reactions Following Ultra Fast Substrate Excitation: A Path Towards Atomic Scale Resolution of High-temperature Reactions at Metal Surfaces. [R] . Bartels, L. 2010

机译：超快基板激发后的表面反应：金属表面高温反应的原子尺度分辨率的一条路径。

Applied Surface Science Zirconium-Assisted Reaction In Low Temperature Atomic Layer Deposition Using Bis(Ethyl-Methyl-Amino)Silane And Water

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