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首页> 外文期刊>Applied Surface Science >Wafer-level fabrication and optical characterization of nanoscale patterned sapphire substrates
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Wafer-level fabrication and optical characterization of nanoscale patterned sapphire substrates

机译：纳米级图案化蓝宝石衬底的晶圆级制造和光学表征

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摘要

The wafer-level aperiodic nanostructures were fabricated atop the sapphire substrates in order to increase the transmittance over broadband spectra. The fabrication was presented along with characterization of their optical properties. The nanostructures were patterned using natural lithography with nickel silicide as a hard mask, and the subsequent etching was performed using inductively coupled plasma dry-etching method. The sapphire substrates with nanostructures compared to conventional sapphire substrates, which exhibit antireflective characteristics over broadband spectra at a wide range of incident angles. The nanostructures reduce the reflection down to 5% in the visible spectrum for normal incidence. The transmittance of visible to near-IR spectra was found to be 94% at normal incidence and over 90% at an incident angle of 45°. In the mid-IR spectrum, the transmittance exceeds 88% until the reflection is no longer suppressed by nanostructures. The polarization properties have also been investigated. The nanostructures can enhance the reflectivity ratio 90% for wavelengths shorter than 400 nm. As the amplitude ratio, enhanced from 50% to 80% over the whole visible spectrum.
机译：为了在宽带光谱上增加透射率，在蓝宝石衬底上制造了晶圆级非周期性纳米结构。介绍了制造过程及其光学特性的表征。使用自然光刻法以硅化镍作为硬掩模对纳米结构进行构图，然后使用电感耦合等离子体干法刻蚀进行后续刻蚀。与常规蓝宝石衬底相比，具有纳米结构的蓝宝石衬底在宽的入射角范围内在宽带光谱上均具有抗反射特性。对于垂直入射，纳米结构将可见光谱中的反射降低到5％。发现可见光到近红外光谱的透射率在法向入射时为94％，在45°入射角时超过90％。在中红外光谱中，透射率超过88％，直到反射不再被纳米结构抑制为止。还研究了偏振特性。对于小于400nm的波长，纳米结构可以将反射率提高90％。在整个可见光谱范围内，振幅比从50％提高到80％。

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  • 来源
    《Applied Surface Science》 |2011年第1期|p.2-6|共5页
  • 作者

    Yu-ShengLin; Wen-ChingHsu; Kuo-ChengHuang; J. AndrewYeh;

  • 作者单位

    Institute ofNanoEngineering and Microsystems, National Tsing Hua University, Hsinchu 30013, Taiwan;

    Sino-American Silicon Products Incorporation, Hsinchu, Taiwan;

    Instrument Technology Research Center (ITRC), National Applied Research Laboratories, Hsinchu, Taiwan;

    Institute ofNanoEngineering and Microsystems, National Tsing Hua University, Hsinchu 30013, Taiwan, Instrument Technology Research Center (ITRC), National Applied Research Laboratories, Hsinchu, Taiwan, Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    patterned sapphire; antireflection; natural lithography;

    机译：蓝宝石防反射自然光刻;

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