TiO_2/polyaniline nanocomposite films prepared by magnetron sputtering combined with plasma polymerization process

Arup R Pal; Bimal K. Sarma; Nirab C Adhikary; Joyanti Chutia; Heremba Bailung

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TiO_2/polyaniline nanocomposite films prepared by magnetron sputtering combined with plasma polymerization process

机译：磁控溅射-等离子体聚合法制备TiO_2 /聚苯胺纳米复合薄膜

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Radiofrequency plasma polymerization in combination with direct current reactive magnetron sputtering is utilized for the synthesis of TiO_2/plasma polymerized aniline nanocomposite thin films. In the composite film, X-ray diffraction measurements reveal formation of nanocrystalline rutile TiO_2 of crystallite size 3.6 nm. Due to continuous bombardment of plasma species during simultaneous magnetron sputtering and plasma polymerization, the precursors of polymerization are broken and few functional groups are retained in the composite film. The plasma polymerized aniline has the direct optical band gap of 3.55 eV and the nanocrystalline rutile TiO$2 is wide gap semiconductor with indirect gap of 3.20eV which suggests the existence of an energy barrier at the interface in the composite form. The ac conductivity of composite film shows significant improvement as compared to plasma polymerized aniline film and sputtered rutile TiO_2 film. The composite film may find potential application as antistatic coatings.

机译：射频等离子体聚合与直流反应磁控溅射相结合，用于TiO_2 /等离子体聚合的苯胺纳米复合薄膜的合成。在复合膜中，X射线衍射测量表明形成了微晶尺寸为3.6 nm的纳米金红石型TiO_2。由于在同时进行的磁控溅射和等离子体聚合过程中连续轰击等离子体物质，所以聚合的前体被破坏，并且几乎没有官能团保留在复合膜中。等离子体聚合的苯胺具有3.55 eV的直接光学带隙，而纳米晶金红石TiO $ 2是具有3.20eV的间接间隙的宽间隙半导体，这表明在复合形式的界面处存在能垒。与等离子体聚合的苯胺薄膜和溅射的金红石型TiO_2薄膜相比，复合薄膜的交流电导率显示出显着改善。复合膜可作为抗静电涂料找到潜在的应用。

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来源
《Applied Surface Science》 |2011年第3期|p.1199-1205|共7页
作者
Arup R Pal; Bimal K. Sarma; Nirab C Adhikary; Joyanti Chutia; Heremba Bailung;
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作者单位

Physical Sciences Division, Institute of Advanced Study in Science and Technology, Garchuk, Guwahati 781035, India;

Physical Sciences Division, Institute of Advanced Study in Science and Technology, Garchuk, Guwahati 781035, India;

Physical Sciences Division, Institute of Advanced Study in Science and Technology, Garchuk, Guwahati 781035, India;

Physical Sciences Division, Institute of Advanced Study in Science and Technology, Garchuk, Guwahati 781035, India;

Physical Sciences Division, Institute of Advanced Study in Science and Technology, Garchuk, Guwahati 781035, India;

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TiO_2/polyaniline nanocomposite; plasma polymerization; magnetron sputtering; intermetallic dielectrics; antistatic coating;

机译：TiO_2 /聚苯胺纳米复合材料;等离子体聚合;磁控溅射;金属间电介质;抗静电涂料;

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TiO_2/polyaniline nanocomposite films prepared by magnetron sputtering combined with plasma polymerization process

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