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Surface modification of doped ZnO thin films

机译:掺杂ZnO薄膜的表面改性

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摘要

Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting "smooth" surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
机译:研究了光辅助无电极和离子RF溅射刻蚀对溅射ZnO:Al薄膜的结构和光学性能的影响。光辅助无电极蚀刻适用于获得“光滑”的表面,并且通过高功率进行的离子RF溅射蚀刻显着地改变了表面粗糙度,并增加了光扩散透射率。

著录项

  • 来源
    《Applied Surface Science》 |2010年第18期|P.5606-5609|共4页
  • 作者单位

    Department of Microelectronics, Slovak University of Technology, Bratislava, Slovakia;

    rnDepartment of Microelectronics, Slovak University of Technology, Bratislava, Slovakia;

    rnDepartment of Materials & Technology, New Technology Center, University of West Bohemia, Plzen, Czech Republic;

    rnDepartment of Microelectronics, Slovak University of Technology, Bratislava, Slovakia;

    rnDepartment of Microelectronics, Slovak University of Technology, Bratislava, Slovakia;

    rnDepartment of Materials & Technology, New Technology Center, University of West Bohemia, Plzen, Czech Republic;

    rnDepartment of Microelectronics, Slovak University of Technology, Bratislava, Slovakia;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin-film solar cell; ZnO:Al; sputtering;

    机译:薄膜太阳能电池ZnO:Al;溅镀;

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