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Influence of the hydrothermal temperature and pH on the crystallinity of a sputtered hydroxyapatite film

机译:水热温度和pH值对溅射羟基磷灰石薄膜结晶度的影响

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摘要

Hydroxyapatite (HA) was coated onto titanium substrates using radio frequency sputtering, and the sputtered films were crystallized under hydrothermal conditions at 110-170 ℃ at pH values of 7.0 and 9.5. The crystallite size, the remnant film thickness, and the surface morphology of the films were observed using X-ray diffraction, energy dispersive X-ray spectroscopy, and scanning electron microscopy, respectively. The crystallite size increased with the process temperature, and reached 123.6 nm (pH 9.5 and 170 ℃) after 24 h. All of the crystallite sizes of the film treated at pH 9.5 were higher than those treated at pH 7.0 at each process temperature. The film treated at pH 9.5 retained more than 90% of the initial film thickness at any process temperature. The ratio of the film treated at pH 7.0 did not reached 90% at less than 150 ℃, and tended to increase with the process temperature.
机译:使用射频溅射将羟基磷灰石(HA)涂覆到钛基体上,在110-170℃的水热条件下,在pH值为7.0和9.5的条件下,将溅射的薄膜结晶。分别使用X射线衍射,能量色散X射线光谱和扫描电子显微镜观察膜的微晶尺寸,剩余膜厚度和膜的表面形态。晶粒尺寸随工艺温度的增加而增加,并在24 h后达到123.6 nm(pH 9.5和170℃)。在每个工艺温度下,在pH 9.5下处理的膜的所有微晶尺寸均比在pH 7.0下处理的膜的微晶尺寸均高。在任何处理温度下,在pH 9.5下处理的薄膜都保留了初始薄膜厚度的90%以上。 pH值7.0下处理的膜的比例在低于150℃时达不到90%,并随处理温度的增加而增加。

著录项

  • 来源
    《Applied Surface Science》 |2010年第23期|P.7027-7031|共5页
  • 作者

    K. Ozeki; H. Aoki; T. Masuzawa;

  • 作者单位

    Department of Mechanical Engineering, Ibaraki University, 4-12-1, Nakanarusawa, Hitachi, Ibaraki, 316-8511 Japan;

    rnInternational Apatite Co., Ltd., 20 Kanda-Ogawamachi 3-Chome, Chiyoda-ku, Tokyo 101 -0052, Japan;

    rnDepartment of Mechanical Engineering, Ibaraki University, 4-12-1, Nakanarusawa, Hitachi, Ibaraki, 316-8511 Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    hydroxyapatite; sputtering; hydrothermal; crystallinity;

    机译:羟基磷灰石溅射水热结晶度;

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