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Effect Of The Amorphous Thin Layer On The Surface Growth Of Amorphous/crystalline Binary Multilayer Films

机译:非晶薄层对非晶/晶体二元多层膜表面生长的影响

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The effect of the amorphous thin layer on the surface growth of amorphous/crystalline binary multilayer films has been studied by using a continuum model. It is shown that both the surface roughness and the growth exponent of amorphous/crystalline binary multilayer films decrease with increasing thickness ratio between amorphous and crystalline layers. Our simulations have also revealed, in contrast to the monotonous rise in surface roughness observed in single-layer films grown on flat substrates, the surface growth of a multilayer film consists of two processes: interface smoothing and roughening, namely the film roughness decreases during the growth of amorphous thin layers but increases monotonously during the growth of crystalline thin layers. The observed interface smoothing and roughening can be obviously influenced by the change in the thickness ratio between amorphous and crystalline layers. The rise in thickness ratio between amorphous and crystalline layers enhances the interface smoothing effect but lowers the interface roughening effect and consequently shows a marked smoothing effect on the surface roughness.
机译:通过使用连续模型,研究了非晶薄层对非晶/结晶二元多层膜表面生长的影响。结果表明,非晶/结晶二元多层膜的表面粗糙度和生长指数均随非晶和结晶层之间的厚度比增加而降低。我们的模拟还显示,与在平坦基板上生长的单层膜中观察到的表面粗糙度的单调上升相反,多层膜的表面生长包括两个过程:界面平滑和粗糙化,即膜的粗糙度在抛光过程中减小。非晶薄层的生长,但在晶体薄层的生长过程中单调增加。所观察到的界面平滑和粗糙化可以明显地受到非晶和结晶层之间的厚度比变化的影响。非晶层和结晶层之间的厚度比的增加增强了界面平滑效果,但是降低了界面粗糙效果,因此对表面粗糙度显示出显着的平滑效果。

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