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Structure And Morphology Of Cui Film Grown By Electrodeposition Method: A Study Of Neutron Reflectivity And Afm

机译:电沉积法生长的Cu / Ni薄膜的结构和形貌:中子反射率和afm的研究

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摘要

We present detailed study of structure and interface morphology of an electrodeposited Cu/Ni film using X-ray diffraction. X-ray reflectivity, neutron reflectivity and atomic force microscopy (AFM) techniques. The crystalline structure of the film has been determined by X-ray diffraction, which suggest polycrystalline growth of the film. The depth profile of density in the sample has been obtained from specular X-ray and neutron reflectivity measurements. AFM image of the air-film interface shows that the surface is covered by globular islands of different sizes. The AFM height distribution of the surface clearly shows two peaks and the relief structure (islands) on the surface in the film, which can be treated as a quasi-two-level random rough surface structure. We have demonstrated that the detailed morphology of air-film interfaces, the quasi-two-level surface structure as well as morphology of the buried interfaces can be obtained from off-specular neutron reflectivity data. AFM and off-specular neutron reflectivity measurements also show that the morphologies of electrodeposited surface is distinctively different as compared to that of sputter-deposited surfaces in the sample.
机译:我们目前使用X射线衍射对电沉积Cu / Ni膜的结构和界面形态进行详细研究。 X射线反射率,中子反射率和原子力显微镜(AFM)技术。膜的晶体结构已经通过X射线衍射确定,这暗示了膜的多晶生长。样品中密度的深度分布图是从镜面X射线和中子反射率测量获得的。气膜界面的AFM图像显示表面被大小不同的球状岛所覆盖。表面的AFM高度分布清楚地显示了膜表面上的两个峰和浮雕结构(岛),可以将其视为准两级随机粗糙表面结构。我们已经证明,可以从非镜面中子反射率数据获得气膜界面的详细形态,准两层表面结构以及掩埋界面的形态。 AFM和镜下中子反射率测量还显示,与样品中的溅射沉积表面相比,电沉积表面的形态显着不同。

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