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Influence Of Si-n Interlayer On The Microstructure And Magnetic Properties Of γ'-fe_4n Films

机译：Si-n中间层对γ'-fe_4n薄膜微结构和磁性能的影响

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摘要

The (γ'-Fe_4N/Si-N)_n (n: number of layers) multilayer films and γ'-Fe_4N single layer film synthesized on Si (100) substrates by direct current magnetron sputtering were annealed at different temperatures. The structures and magnetic properties of as-deposited films and films annealed at different temperatures were characterized using X-ray diffraction, scanning electron microscopy and vibrating sample magnetometer. The results showed that the insertion of Si-N layer had a significant influence on the structures and magnetic properties of γ'-Fe_4N film. Without the addition of Si-N lamination, the iron nitride γ'-Fe_4N tended to transform to α-Fe when annealed at the temperatures over 300 ℃. However, the phase transition from γ'-Fe_4N to e-Fe_3N occurred at annealing temperature of 300 ℃ for the multilayer films. Furthermore, with increasing annealing temperature up to 400 ℃ or above, ε-Fe_3N transformed back into γ'-Fe_4N. The magnetic investigations indicated that coercivity of magnetic phase γ'-Fe_4N for as-deposited firms decreased from 152 Oe (for single layer) to 57.23 Oe with increasing n up to 30. For the annealed multilayer films, the coercivity values decreased with increasing annealing temperature, except that the film annealed at 300 ℃ due to the appearance of phase ε-Fe_3N.
机译：通过直流磁控溅射在Si（100）衬底上合成的（γ'-Fe_4N/ Si-N）_n（n：层数）多层膜和γ'-Fe_4N单层膜在不同温度下退火。利用X射线衍射，扫描电子显微镜和振动样品磁强计对沉积薄膜和在不同温度退火的薄膜的结构和磁性进行了表征。结果表明，Si-N层的插入对γ'-Fe_4N薄膜的结构和磁性能有显着影响。如果不添加Si-N叠层，则在300℃以上的温度下进行退火时，氮化铁γ'-Fe_4N倾向于转变为α-Fe。然而，多层膜在300℃的退火温度下发生了从γ'-Fe_4N到e-Fe_3N的相变。此外，随着退火温度升高至400℃或更高，ε-Fe_3N转变回γ'-Fe_4N。磁性研究表明，沉积态公司的磁性相γ'-Fe_4N的矫顽力从152 Oe（单层）降低到57.23 Oe，随n的增加而增加到30。对于退火的多层膜，矫顽力值随着退火量的增加而降低除了由于出现ε-Fe_3N相而使薄膜在300℃退火外，其他条件是相同的。

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