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Raman Spectroscopic Studies Of Pb_xla_(1-x)ti_(1-x/4)o_3 Thin Films Grown On Si Substrates By Rf Magnetron Sputtering

机译:射频磁控溅射在Si衬底上生长的Pb_xla_(1-x)ti_(1-x / 4)o_3薄膜的拉曼光谱研究

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摘要

A systematic spectroscopic investigation of Pb_xLa_(1-x)Ti_(1-x/4)O_3 (PLT) thin films grown on PbO/Pt/Ti/SiO_2/Si substrate by RF magnetron sputtering was performed by using confocal Raman spectroscopy. Influence of the growth condition modification including different growth temperatures, with various buffer layer thickness, and post-annealing treatments were analyzed with taking advantages of the corresponding Raman spectral band variation in the respective process. Significant change in the spectral bands occurred with the alteration of the growth condition, and the related mechanisms were discussed after spectral deconvolution, providing reliable information about the direction for film growth.
机译:利用共聚焦拉曼光谱技术对在PbO / Pt / Ti / SiO_2 / Si衬底上生长的Pb_xLa_(1-x)Ti_(1-x / 4)O_3(PLT)薄膜进行了系统的光谱研究。利用在各个过程中相应的拉曼光谱带变化的优势,分析了包括不同生长温度,具有不同缓冲层厚度的生长条件修改的影响,以及后退火处理。随着生长条件的改变,光谱带发生了显着变化,光谱去卷积后讨论了相关机理,从而提供了有关膜生长方向的可靠信息。

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