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首页> 外文期刊>Applied Surface Science >Strong Room-temperature Ultraviolet Emission From Nanocrystalline Zno And Zno:ag Films Grown By Ultrasonic Spray Pyrolysis
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Strong Room-temperature Ultraviolet Emission From Nanocrystalline Zno And Zno:ag Films Grown By Ultrasonic Spray Pyrolysis

机译：超声喷雾热解法生长的纳米晶Zno和Zno：ag薄膜的强室温紫外线发射

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摘要

Nanocrystalline ZnO and ZnO:Ag films have been deposited on Si (1 0 0) substrates by ultrasonic spray pyrolysis (USP) technique under ambient atmosphere. Among pure ZnO films, the sample deposited at 500℃ with spray rate of 0.15 ml/min has the strongest near-band edge (NBE) ultraviolet emission (378 nm) observed in the room-temperature photoluminescence (RT PL) measurement. Its PL intensity ratio (R) of the UV emission to the deep-level emission has a largest value of 470 and the full-width at half-maximum (FWHM) of UV peak has a smallest value of 10 nm (87 meV). Moreover, RT PL spectra show that compared with undoped ZnO, the UV emission intensity of ZnO:Ag films (with the Ag:Zn atomic ratio = 3% in the precursor solution) is even markedly enhanced and the R increases to the value of at least 700. However, a silver phase is detected and the UV luminescence becomes weak for ZnO:Ag films after the annealing at 700 ℃ in air for 1 h.
机译：在环境气氛下，通过超声喷雾热解（USP）技术将纳米晶态的ZnO和ZnO：Ag薄膜沉积在Si（1 0 0）衬底上。在纯ZnO薄膜中，以室温下的光致发光（RT PL）测量观察到，在500℃下以0.15 ml / min的喷射速率沉积的样品具有最强的近带边缘（NBE）紫外线发射（378 nm）。 UV发射与深层发射的PL强度比（R）的最大值为470，UV峰的半峰全宽（FWHM）的最小值为10 nm（87 meV）。此外，RT PL光谱显示，与未掺杂的ZnO相比，ZnO：Ag薄膜（前体溶液中的Ag：Zn原子比= 3％）的UV发射强度甚至显着增强，并且R增加到的值。至少700。但是，在空气中700℃退火1小时后，ZnO：Ag薄膜检测到银相并且UV发光变弱。

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