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首页> 外文期刊>Thin Solid Films >Influence of precursor type, deposition time and doping concentration on the morphological, electrical and optical properties of ZnO and ZnO:Al thin films grown by ultrasonic spray pyrolysis
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Influence of precursor type, deposition time and doping concentration on the morphological, electrical and optical properties of ZnO and ZnO:Al thin films grown by ultrasonic spray pyrolysis

机译：前驱体类型，沉积时间和掺杂浓度对超声喷雾热解ZnO和ZnO：Al薄膜的形貌，电学和光学性质的影响

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摘要

The influence of precursor type, deposition time and doping concentration on the morphological, optical and electrical characteristics of ZnO and ZnO:Al thin films and nanostructures deposited by ultrasonic spray pyrolysis at 400 ℃ on glass substrates was investigated. A deposition period of 30 min resulted in compact, uniform samples with thickness of 30 and 45 nm, and growth rates in the order of 1 and 1.5 nm/min for the Zn acetate and Zn nitrate precursors, respectively. The as-grown films showed good adhesion and excellent optical transmission. Moreover, films grown using Zn acetate precursor exhibited considerably low resistivity, being 14Ω· cm for a deposition time of 30 min. Surface roughness was observed to increase with deposition time, while Al doping up to 5% reduced the resistivity down to 4 Ω·cm without affecting the optical transmission of the films. Finally, films grown using Zn nitrate were observed to exhibit better photoconductivity than those grown with Zn acetate.
机译：研究了前驱体的种类，沉积时间和掺杂浓度对玻璃衬底上ZnO和ZnO：Al薄膜的形貌，光学和电学特性以及在400℃下超声喷雾热解沉积的纳米结构的影响。 30分钟的沉积时间可生成致密，均匀的样品，厚度分别为30和45 nm，乙酸锌和硝酸锌前体的生长速度分别为1和1.5 nm / min。所生长的膜表现出良好的粘附性和优异的光学透射率。而且，使用乙酸锌前体生长的膜表现出相当低的电阻率，在30分钟的沉积时间内为14Ω·cm。观察到表面粗糙度随沉积时间而增加，而Al掺杂达5％则将电阻率降低至4Ω·cm，而不会影响薄膜的光学透射率。最后，观察到使用硝酸锌生长的膜比使用乙酸锌生长的膜表现出更好的光电导性。

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  • 来源
    《Thin Solid Films》 |2014年第31期|62-67|共6页
  • 作者

    G. Kenanakis; N. Katsarakis; E. Koudoumas;

  • 作者单位

    Center of Materials Technology and Photonics, School of Applied Technology, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece,Institute of Electronic Structure and Laser, Foundation for Research & Technology-Hellas, P.O. Box 1385, Vassilika Vouton, 711 10 Heraklion, Crete, Greece,Science Department, School of Applied Technology, Technological Educational Institute of Crete, 71004 Heraklion, Crete, Greece;

    Center of Materials Technology and Photonics, School of Applied Technology, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece,Institute of Electronic Structure and Laser, Foundation for Research & Technology-Hellas, P.O. Box 1385, Vassilika Vouton, 711 10 Heraklion, Crete, Greece,Science Department, School of Applied Technology, Technological Educational Institute of Crete, 71004 Heraklion, Crete, Greece;

    Center of Materials Technology and Photonics, School of Applied Technology, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece,Electrical Engineering Department, Technological Educational Institute of Crete, 710 04 Heraklion, Crete, Greece;

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  • 正文语种 eng
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  • 关键词

    Zinc oxide; Aluminum-doped zinc oxide; Thin films; Ultrasonic spray pyrolysis; Electrical properties; Optical properties;

    机译：氧化锌铝掺杂氧化锌;薄膜;超声波喷雾热解;电气性能;光学性质;

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