Fabrication of microrods and microtips of InP by electrochemical etching

Zhankun Weng; Aimin Liu; Yanhong Liu; Feng Xu; Guoqing Li; Xiaojuan Sun

首页> 外文期刊>Applied Surface Science >Fabrication of microrods and microtips of InP by electrochemical etching

【24h】

Fabrication of microrods and microtips of InP by electrochemical etching

机译：通过电化学蚀刻制备InP的微棒和微尖端

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Here we presented a simple approach to fabricate the microstructures of InP by electrochemical etching. Microrods were formed while InP etched in 7 M HC1 solutions for 30 s, and microtips were obtained while InP etched for 120 s. In addition, with increasing applied potential the surface of the microrods became smoother. The formation mechanism was also discussed in this article.

机译：在这里，我们提出了一种通过电化学刻蚀制造InP微观结构的简单方法。 InP在7 M HCl溶液中腐蚀30 s时形成微棒，而InP腐蚀120 s则获得微尖端。另外，随着施加电势的增加，微棒的表面变得更光滑。本文还讨论了形成机理。

著录项

来源
《Applied Surface Science》 |2007年第11期|5133-5136|共4页
作者
Zhankun Weng; Aimin Liu; Yanhong Liu; Feng Xu; Guoqing Li; Xiaojuan Sun;
展开▼
作者单位

School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, PR China;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
indium phosphide; microrods; microtips; electrochemical etching;

机译：磷化铟微棒微尖电化学蚀刻;

相似文献

外文文献
中文文献
专利

1. Fabrication of self-aligned gated silicon microtip array using electrochemical silicon etching [J] . G. Barillaro, F. DAngelo, G. Pennelli, Physica Status Solidi. A, Applied Research . 2005,第8期

机译：使用电化学硅刻蚀制备自对准门控硅微尖端阵列
2. Effects of Electrochemical Etching on InP HEMT Fabrication [J] . Saranovac Tamara, Ruiz Diego C., Han Daxin, IEEE Transactions on Semiconductor Manufacturing . 2019,第4期

机译：电化学刻蚀对InP HEMT制备的影响
3. Fabrication of hollow microtip electrode array with variable diameter using self-aligned etching process [J] . Nam Kyeong-Taek, Lee Seung-Ki, Park Jae-Hyoung Microelectronic Engineering . 2019,第AUGa期

机译：利用自对准刻蚀工艺制造直径可变的中空微尖端电极阵列
4. Fabrication by wet etching of multi-layer GaAlAs/GaAs microtips for SNOM applications [C] . C.Gorecki, S.Khalfallah, H.Kawakatsu, Conference on Optical Devices and Diagnostics in Materials Science 1-4 August 2000 San Diego, USA . 2000

机译：通过湿法蚀刻制造多层SNOM应用的多层GaAlAs / GaAs微尖端
5. Fabrication of Tungsten Tips Suitable for Scanning Probe Microscopy by Electrochemical Etching Methods [D] . Basnet, Gobind 2013

机译：电化学刻蚀法制备适用于扫描探针显微镜的钨棒
6. Pores in n-Type InP: A Model System for Electrochemical Pore Etching [O] . Malte Leisner, Jürgen Carstensen, Helmut Föll 2010

机译：n型InP中的孔：电化学孔蚀模型系统
7. Ion-Beam Etching of InP and Its Application to the Fabrication of High Radiance InGaAsP/InP Light Emitting Diodes [O] . H. Angerstein-kozlowska, B. Macdougall, R. R. Adzic, 1983

机译：Inp的离子束刻蚀及其在高辐射InGaasp / Inp发光二极管制备中的应用

Fabrication of microrods and microtips of InP by electrochemical etching

摘要

著录项

相似文献

相关主题

期刊订阅