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Growth and surface characterization of sputter-deposited molybdenum oxide thin films

机译:溅射沉积氧化钼薄膜的生长和表面表征

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Molybdenum oxide thin films were produced by magnetron sputtering using a molybdenum (Mo) target. The sputtering was performed in a reactive atmosphere of an argon-oxygen gas mixture under varying conditions of substrate temperature (T_s) and oxygen partial pressure (pO_2). The effect of T_s and pO_2 on the growth and microstructure of molybdenum oxide films was examined in detail using reflection high-energy electron diffraction (RHEED), Rutherford backscattering spectrometry (RBS), energy-dispersive X-ray spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM) measurements. The analyses indicate that the effect of T_s and pO_2 on the microstructure and phase of the grown molybdenum oxide thin films is remarkable. RHEED and RBS results indicate that the films grown at 445 ℃ under 62.3% O_2 pressure were stoichiometric and polycrystalline MoO_3. Films grown at lower pO_2 were non-stoichiometric MoO_x films with the presence of secondary phase. The microstructure of the grown Mo oxide films is discussed and conditions were optimized to produce phase pure, stoichiometric, and highly textured polycrystalline MoO_3 films.
机译:使用钼(Mo)靶通过磁控溅射制备氧化钼薄膜。在氩气-氧气混合物的反应性气氛中,在衬底温度(T_s)和氧分压(pO_2)的变化条件下进行溅射。使用反射高能电子衍射(RHEED),卢瑟福背散射光谱(RBS),能量色散X射线光谱(EDS),X-射线光电子能谱(XPS)和扫描电子显微镜(SEM)测量。分析表明,T_s和pO_2对生长的氧化钼薄膜的微观结构和相的影响是显着的。 RHEED和RBS结果表明,在445℃和62.3%O_2压力下生长的薄膜是化学计量的和多晶的MoO_3。在较低的pO_2处生长的膜是具有次级相的非化学计量的MoO_x膜。讨论了生长的Mo氧化物薄膜的微观结构,并优化了条件以生产相纯,化学计量和高度织构化的多晶MoO_3薄膜。

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